Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CALM1 | P0DP23 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 4/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | IDO1 | P14902 | 3/20 | 0.45 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.45 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL10885367 | 0.97 | CALM1 (0.47) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| Iodide SCHEMBL10884305 | 0.97 | CALM1 (0.47) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| SCHEMBL9498864 | 0.91 | CALM1 (0.43) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| SCHEMBL9456777 | 0.87 | CALM1 (0.39) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| SCHEMBL396269 | 0.83 | TP53 (0.50) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| SCHEMBL8973723 | 0.83 | TP53 (0.50) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| Sulfuric Acid SCHEMBL9457320 | 0.83 | CA2 (0.41) | CALM1TSHRIDO1HSD17B10CES2 | |
| Hydrochloric Acid SCHEMBL967040 | 0.81 | TP53 (0.48) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| Bromide SCHEMBL29399740 | 0.81 | TP53 (0.48) | CALM1TSHRALDH1A1IDO1LOXL2 | |
| Sulfuric Acid SCHEMBL3297014 | 0.81 | TSHR (0.44) | TSHRALDH1A1HSD17B10SMN1; SMN2CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 764 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| US-9075306-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| EP-0424314-B1 | Heat curable mixtures | CIBA GEIGY AG (CH) | 1994-12-07 | — | — | EP | claimed |
| EP-0379464-B1 | ARALIPHATIC SULFONIUM SALTS AND THEIR USE | CIBA-GEIGY AG (CH) | 1993-02-10 | — | — | EP | claimed |
| JP-8314130-A | — | — | None | — | — | JP | disclosed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| US-5374697-A | Selected novel sulfonium compounds particularly suitable as initiators for the thermal cure of cationically polymerisable materials | CIBA-GEIGY CORPORATION (US) | 1994-12-20 | — | — | US | disclosed |
| EP-0555058-A1 | (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing composition | TOYO INK MANUFACTURING CO., LTD. (JP) | 1993-08-11 | — | — | EP | disclosed |
| EP-0039897-B1 | IMPROVED PROCESS FOR FUSION BONDING OF FLUOROCARBON TYPE POLYMERS | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1984-08-22 | — | — | EP | disclosed |
| US-4339549-A | Process for fusion bonding of fluorocarbon type polymers which comprises counter-ion substitution prior to fusion bonding | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1982-07-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260093177-A1 | PATTERNING PROCESS | ARFGAP1, ARF1, ARF4 | CALM1 4429/4885TSHR 2852/4885ALDH1A1 2715/4885 |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | RAD51, CDH1, SMC2 | CALM1 3954/4885TSHR 3629/4885ALDH1A1 1225/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.