SCHEMBL11613628

SCHEMBL11613628

O=[N+]([O-])S(=O)(=O)[O-].[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28478163 0.92 ALDH1A1 (0.38)
Sulfuric Acid SCHEMBL11406033 0.78 MEN1 (0.50)
Sulfuric Acid SCHEMBL9227934 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL28195775 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL28341519 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL31258209 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL28195773 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL28152105 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL28195099 0.75 MEN1 (0.46)
Sulfuric Acid SCHEMBL28195100 0.75 MEN1 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240228291-A9 NANOFORMULATED COMPOSITES AND APPLICATIONS THEREOF TANIMOLA OLANREWAJU (US) 2024-07-11 US disclosed
US-20240132356-A1 NANOFORMULATED COMPOSITES AND APPLICATIONS THEREOF TANIMOLA OLANREWAJU (US) 2024-04-25 US disclosed
US-20240105395-A1 Atomically Precise Nanostructures and Applications Thereof TANIMOLA OLANREWAJU (US) 2024-03-28 US disclosed
US-20240083751-A1 METHODS FOR SYNTHESIS OF CARBON-NANOTUBES FROM ASPHALTENES TANIMOLA OLANREWAJU (US) 2024-03-14 US disclosed
US-20240083909-A1 2D NON-CARBON NANOMATERIALS AND APPLICATIONS THEREOF TANIMOLA OLANREWAJU (US) 2024-03-14 US disclosed
US-20240083752-A1 Methods for Synthesis of Graphene from Asphaltenes CARBONEXT INC 2024-03-14 US disclosed
US-11479466-B2 Methods for synthesis of graphene derivatives and functional materials from asphaltenes TANIMOLA OLANREWAJU W (US) 2022-10-25 US disclosed
CN-210394586-U Reaction unit for electrochemically recycling precious metals on HW13 waste circuit boards 珠海市安能环保科技有限公司 2020-04-24 CN disclosed
EP-3177563-A2 METHODS FOR SYNTHESIS OF GRAPHENE DERIVATIVES AND FUNCTIONAL MATERIALS FROM ASPHALTENES, GRAPHENE DERIVATIVES, 2D MATERIALS AND APPLICATIONS OF USE Tanimola, Olanrewaju W. (US) 2017-06-14 EP disclosed
US-20160039678-A1 METHODS FOR SYNTHESIS OF GRAPHENE DERIVATIVES AND FUNCTIONAL MATERIALS FROM ASPHALTENES TANIMOLA OLANREWAJU W (US) 2016-02-11 US disclosed
WO-2016023041-A2 METHODS FOR SYNTHESIS OF GRAPHENE DERIVATIVES AND FUNCTIONAL MATERIALS FROM ASPHALTENES, GRAPHENE DERIVATIVES, 2D MATERIALS AND APPLICATIONS OF USE TANIMOLA OLANREWAJU W (US) 2016-02-11 WO disclosed
US-4124398-A Thiyl bleaching agents for photographic processes EASTMAN KODAK COMPANY (US) 1978-11-07 US disclosed