SCHEMBL131938

SCHEMBL131938

C=CCOS(=O)(=O)[O-].C=CCOS(=O)(=O)[O-].[Na+].[Na+]

nearest known ligand 0.37

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA2 known ✓ P00918 2/20 0.35
CA12 known ✓ O43570 1/20 0.35
CA1 known ✓ P00915 1/20 0.35
RECQL P46063 2/20 0.37
GLA P06280 1/20 0.37
HPGD P15428 1/20 0.37
TSHR P16473 1/20 0.37
MAPK1 P28482 1/20 0.37
EPHX2 P34913 1/20 0.37
BLM P54132 1/20 0.37
CA9 Q16790 2/20 0.35
CA7 P43166 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL62283 1.00
Methane SCHEMBL28948869 0.97 RECQL (0.35) RECQLGLAHPGDTSHRMAPK1
Sulfuric Acid SCHEMBL8733611 0.97 RECQL (0.35) RECQLGLAHPGDTSHRMAPK1
Water SCHEMBL10588110 0.97 RECQL (0.35) RECQLGLAHPGDTSHRMAPK1
Silver SCHEMBL900458 0.95
SCHEMBL2537774 0.95
Zinc Ion SCHEMBL9055657 0.95 CA2 (0.35) RECQLGLAHPGDTSHRMAPK1
SCHEMBL9056640 0.95 CA2 (0.35) RECQLGLAHPGDTSHRMAPK1
SCHEMBL2546488 0.95
SCHEMBL10754911 0.95 CA2 (0.35) RECQLGLAHPGDTSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020195819-A1 METHOD FOR MANUFACTURING OPTICAL FILM AND OPTICAL FILM コニカミノルタ株式会社 2020-10-01 WO disclosed
EP-1975226-B2 Liquid treatment composition PROCTER & GAMBLE (US) 2019-03-13 EP disclosed
US-9581728-B2 Retardation film, polarizing plate and liquid crystal display Konica Minolta, Inc. (JP) 2017-02-28 US disclosed
US-20150323703-A1 RETARDATION FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY Konica Minolta, Inc. (JP) 2015-11-12 US disclosed
US-8969281-B2 Liquid treatment composition THE PROCTER & GAMBLE COMPANY (US) 2015-03-03 US disclosed
EP-1975226-B1 Liquid treatment composition PROCTER & GAMBLE (US) 2013-02-13 EP disclosed
US-8357648-B2 Liquid treatment unitized dose composition THE PROCTER & GAMBLE COMPANY (US) 2013-01-22 US disclosed
US-8236745-B2 Liquid treatment composition THE PROCTER & GAMBLE COMPANY (US) 2012-08-07 US disclosed
US-8188026-B2 Liquid treatment composition THE PROCTER & GAMBLE COMPANY (US) 2012-05-29 US disclosed
EP-2426192-A1 Liquid treatment composition The Procter & Gamble Company (US) 2012-03-07 EP disclosed
US-20010026900-A1 Support and a recording layer whose solubility is altered by irradiation with infrared laser; used for printing plates, color filters, photoresists FUJIFILM CORPORATION (JP) 2001-10-04 US disclosed
EP-1120245-A2 Infrared-sensitive image forming material FUJI PHOTO FILM CO., LTD. (JP) 2001-08-01 EP disclosed
US-5723253-A PHOTOSENSITIVITY FOR LITHOGRAPHIC PRINTING PLATES KONICA CORPORATION (JP) 1998-03-03 US disclosed
EP-0466071-B1 Method of developing presensitized offset printing plates and developing solution used in that method KONISHIROKU PHOTO IND (JP) 1997-12-10 EP disclosed
EP-0639797-B1 Light-sensitive lithographic printing plate and method of processing the same KONISHIROKU PHOTO IND (JP) 1997-07-30 EP disclosed
US-5635328-A Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound KONICA CORPORATION (JP) 1997-06-03 US disclosed
EP-0716344-A1 Light-sensitive composition and light-sensitive lithographic printing plate using the same KONICA CORPORATION (JP) 1996-06-12 EP disclosed
EP-0639797-A1 Light-sensitive lithographic printing plate and method of processing the same KONICA CORPORATION (JP) 1995-02-22 EP disclosed
US-5234796-A Developer contains silica, a surfactant, an aromatic carboxylic acid, and a hydroxyamine compound KONICA CORPORATION (JP) 1993-08-10 US disclosed
EP-0466071-A2 Method of developing presensitized offset printing plates and developing solution used in that method KONICA CORPORATION (JP) 1992-01-15 EP disclosed