Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | GLA | P06280 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.49 |
| ▸ | HTT | P42858 | 3/20 | 0.46 |
| ▸ | CRHBP | P24387 | 1/20 | 0.46 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.46 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | CA9 | Q16790 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | HSD11B2 | P80365 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | DHFR | P00374 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29860505 | 0.92 | ALDH1A1 (0.42) | ALDH1A1POLBGLALMNAHTT | |
| SCHEMBL12308346 | 0.82 | HSD11B1 (0.44) | ALDH1A1POLBGLALMNAHSD11B1 | |
| SCHEMBL19006938 | 0.79 | LMNA (0.49) | ALDH1A1POLBGLALMNAHTT | |
| SCHEMBL13416096 | 0.77 | ALDH1A1 (0.38) | ALDH1A1POLBGLALMNAHTT | |
| SCHEMBL27445055 | 0.77 | LMNA (0.46) | ALDH1A1POLBGLALMNAHTT | |
| SCHEMBL19286899 | 0.76 | ALDH1A1 (0.34) | ALDH1A1POLBHTTNPSR1HSD11B1 | |
| SCHEMBL2742128 | 0.76 | ALDH1A1 (0.43) | ALDH1A1POLBGLALMNAHTT | |
| SCHEMBL23220249 | 0.74 | THRB (0.63) | ALDH1A1GLALMNAHTTCRHBP | |
| SCHEMBL2841738 | 0.74 | THRB (0.63) | ALDH1A1GLALMNAHTTCRHBP | |
| Hydrochloric Acid SCHEMBL28131943 | 0.72 | THRB (0.61) | ALDH1A1GLALMNAHTTCRHBP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-11208415-B2 | Substituted indole Mcl-1 inhibitors | VANDERBILT UNIVERSITY (US) | 2021-12-28 | — | — | US | disclosed |
| EP-3122353-B1 | SUBSTITUTED INDOLE MCL-1 INHIBITORS | UNIV VANDERBILT (US) | 2020-10-28 | — | — | EP | disclosed |
| US-20200140447-A1 | SUBSTITUTED INDOLE MCL-1 INHIBITORS | VANDERBILT UNIVERSITY | 2020-05-07 | — | — | US | disclosed |
| US-20170174689-A1 | SUBSTITUTED INDOLE MCL-1 INHIBITORS | VANDERBILT UNIVERSITY | 2017-06-22 | — | — | US | disclosed |
| US-9523912-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | FUJIFILM CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160106731-A1 | TRICYCLIC INDOLE MCL-1 INHIBITORS AND USES THEREOF | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2016-04-21 | — | — | US | disclosed |
| US-20160070167-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2016-03-10 | — | — | US | disclosed |
| US-9081142-B2 | Photosensitive resin composition for a color filter and uses thereof | CHI MEI CORPORATION (TW) | 2015-07-14 | — | — | US | disclosed |
| US-9081142-B2 | Photosensitive resin composition for a color filter and uses thereof | CHI MEI CORPORATION (TW) | 2015-07-14 | — | — | US | disclosed |
| WO-2008123541-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-16 | — | — | WO | disclosed |
| US-20080248421-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080241746-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080220371-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND USED FOR PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080187863-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-20080138742-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-06-12 | — | — | US | disclosed |
| US-20080085464-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUNDS FOR USE IN THE POSITIVE PHOTOSENSITIVE COMPOSITION, MANUFACTURING METHOD OF THE POLYMER COMPOUNDS, COMPOUNDS FOR USE IN THE MANUFACTURE OF THE POLYMER COMPOUNDS, AND PATTERN-FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| EP-1903395-A1 | Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition | FUJIFILM Corporation (JP) | 2008-03-26 | — | — | EP | disclosed |
| US-20070172761-A1 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070172761-A1 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080220371-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND USED FOR PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING PHOTOSENSITIVE COMPOSITION | RARA, RARB, RARG | ALDH1A1 771/4885POLB 335/4885GLA 275/4885 |
| US-20200140447-A1 | SUBSTITUTED INDOLE MCL-1 INHIBITORS | MCL1, BCL2L1, BCL3 | ALDH1A1 1900/4885POLB 2896/4885GLA 3921/4885 |
| US-20160070167-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | RER1, TERB1, RXRA | ALDH1A1 2066/4885POLB 230/4885GLA 1261/4885 |
| US-20080138742-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION | PAH, TRPA1, TYR | ALDH1A1 1249/4885POLB 1357/4885GLA 2136/4885 |
| US-20160106731-A1 | TRICYCLIC INDOLE MCL-1 INHIBITORS AND USES THEREOF | MCL1, BCL2L1, BCL3 | ALDH1A1 1962/4885POLB 3296/4885GLA 3821/4885 |
| US-20170174689-A1 | SUBSTITUTED INDOLE MCL-1 INHIBITORS | MCL1, BCL2L1, BCL3 | ALDH1A1 1900/4885POLB 2896/4885GLA 3921/4885 |
| US-11208415-B2 | Substituted indole Mcl-1 inhibitors | MCL1, BCL2L1, BCL3 | ALDH1A1 1900/4885POLB 2896/4885GLA 3921/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.