Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13159446 | 0.88 | DGAT1 (0.38) | DGAT1 | |
| SCHEMBL12336624 | 0.88 | DGAT1 (0.38) | DGAT1 | |
| SCHEMBL12465268 | 0.83 | — | — | |
| SCHEMBL178647 | 0.82 | DGAT1 (0.34) | DGAT1 | |
| SCHEMBL17517352 | 0.82 | — | — | |
| SCHEMBL15787232 | 0.80 | CYP4F2 (0.30) | — | |
| SCHEMBL9924218 | 0.80 | — | — | |
| SCHEMBL10126153 | 0.80 | CYP4F2 (0.38) | — | |
| SCHEMBL19361624 | 0.78 | CYP4F2 (0.33) | — | |
| SCHEMBL24106007 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-11-19 | — | — | US | disclosed |
| US-9133357-B2 | White ink composition, ink set for forming multiple layers, image forming method and printed matter | FUJIFILM CORPORATION (JP) | 2015-09-15 | — | — | US | disclosed |
| US-20140287206-A1 | WHITE INK COMPOSITION, INK SET FOR FORMING MULTIPLE LAYERS, IMAGE FORMING METHOD AND PRINTED MATTER | FUJIFILM CORPORATION (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20120320123-A1 | INK SET AND IMAGE FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-12-20 | — | — | US | disclosed |
| US-7759045-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-20 | — | — | US | disclosed |
| US-7667050-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7625689-B2 | better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-12-01 | — | — | US | disclosed |
| US-7576223-B2 | Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20090004601-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-01 | — | — | US | disclosed |
| US-20080269506-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2008-10-30 | — | — | US | disclosed |
| US-20080086014-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20070212641-A1 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080269506-A1 | Chemical amplification type resist composition | ASIC1, POLR2B, POLR2A | DGAT1 3913/4885 |
| US-20150331314-A1 | PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | RER1, CROCC, RFT1 | DGAT1 952/4885 |
| US-20080086014-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, SLC26A3, KCNN4 | DGAT1 845/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.