Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.42 |
| ▸ | CES1 | P23141 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.30 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.30 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.30 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8175703 | 0.72 | CES2 (0.68) | CES2CES1HTTLMNATP53 | |
| SCHEMBL661258 | 0.72 | CES2 (0.46) | CES2CES1HTTLMNATP53 | |
| SCHEMBL29449985 | 0.69 | CES2 (0.43) | CES2CES1HTTLMNATP53 | |
| SCHEMBL6448128 | 0.69 | CES2 (0.43) | CES2CES1HTTLMNATP53 | |
| SCHEMBL203915 | 0.69 | CES2 (0.43) | CES2CES1HTTLMNATP53 | |
| SCHEMBL317184 | 0.69 | CES2 (0.43) | CES2CES1HTTLMNATP53 | |
| SCHEMBL336394 | 0.69 | CES2 (0.43) | CES2CES1HTTLMNATP53 | |
| SCHEMBL217793 | 0.69 | CES2 (0.43) | CES2CES1HTTLMNATP53 | |
| Ammonia Solution, Strong SCHEMBL9326028 | 0.69 | CA1 (0.56) | CES2CES1HTTLMNATP53 | |
| Ethylene SCHEMBL4584731 | 0.69 | CES2 (0.39) | CES2CES1HTTLMNATP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9128370-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-09-08 | — | — | US | disclosed |
| CN-102532162-B | 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles | OTSUKA PHARMA CO LTD | 2015-05-27 | — | — | CN | disclosed |
| US-9023584-B2 | Radiation-sensitive composition, and compound | JSR CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8771923-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| EP-2080774-B1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-20130280658-A1 | RADIATION-SENSITIVE COMPOSITION, AND COMPOUND | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| EP-1678185-A1 | 2,3-DIHYDRO-6-NITROIMIDAZO [2,1-B] OXAZOLE COMPOUNDS FOR THE TREATMENT OF TUBERCULOSIS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20060094767-A1 | 2,3-Dihydro-6-nitroimidazo[2,1-b]oxazoles | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2006-05-04 | — | — | US | disclosed |
| EP-1600437-A1 | ACID GENERATORS, SULFONIC ACIDS, SULFONYL HALIDES, AND RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2005-11-30 | — | — | EP | disclosed |
| EP-1555267-A1 | 2,3-DIHYDRO-6-NITROIMIDAZO 2,1-b OXAZOLES | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2005-07-20 | — | — | EP | disclosed |
| US-6908722-B2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-06-21 | — | — | US | disclosed |
| WO-2005042542-A1 | 2,3-DIHYDRO-6-NITROIMIDAZO (2,1-B) OXAZOLE COMPOUNDS FOR THE TREATMENT OF TUBERCULOSIS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2005-05-12 | — | — | WO | disclosed |
| US-6824954-B2 | DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | CES2 991/4885CES1 391/4885HTT 2667/4885 |
| US-20060094767-A1 | 2,3-Dihydro-6-nitroimidazo[2,1-b]oxazoles | NR2C2, NR4A3, NR4A2 | CES2 3025/4885CES1 2795/4885HTT 4644/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | CES2 225/4885CES1 124/4885HTT 4125/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.