SCHEMBL1355394

SCHEMBL1355394

O=C(O)C1=CC(C(=O)O)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23095736 0.84
SCHEMBL8213643 0.75 CCR2 (0.34)
Hydrochloric Acid SCHEMBL11426078 0.73 OAT (0.36)
SCHEMBL23095830 0.72
SCHEMBL11580203 0.72 PTGS2 (0.30)
SCHEMBL16385093 0.69 ALDH1A1 (0.31)
SCHEMBL14161536 0.69
SCHEMBL16421301 0.69 ABAT (0.37)
SCHEMBL11580200 0.68 KEAP1 (0.33)
SCHEMBL11428313 0.68 SMN1; SMN2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 US claimed
WO-2020022086-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION INCLUDING HETEROATOM IN POLYMER MAIN CHAIN 日産化学株式会社 2020-01-30 WO disclosed
US-8277897-B2 Reactive polymer-supporting porous film for battery separator and use thereof NITTO DENKO CORPORATION (JP) 2012-10-02 US disclosed
US-8062387-B2 Reactive polymer-supporting porous film for battery separator and use thereof NITTO DENKO CORPORATION (JP) 2011-11-22 US disclosed
US-20110232081-A1 REACTIVE POLYMER-SUPPORTING POROUS FILM FOR BATTERY SEPARATOR AND USE THEREOF UETANI YOSHIHIRO 2011-09-29 US disclosed
US-20110232836-A1 REACTIVE POLYMER-SUPPORTING POROUS FILM FOR BATTERY SEPARATOR AND USE THEREOF UETANI YOSHIHIRO 2011-09-29 US disclosed
EP-1667253-B1 REACTIVE POLYMER-SUPPORTING POROUS FILM FOR BATTERY SEPARATOR AND USE THEREOF NITTO DENKO CORP (JP) 2010-11-10 EP disclosed
US-20060257727-A1 Reactive polymer-supporting porous film for battery seperator and use thereof NITTO DENKO CORPORATION (JP) 2006-11-16 US disclosed
EP-1667253-A1 REACTIVE POLYMER-SUPPORTING POROUS FILM FOR BATTERY SEPARATOR AND USE THEREOF NITTO DENKO CORPORATION (JP) 2006-06-07 EP disclosed
US-6906116-B2 Unsaturated polyester compounds, resins curable with actinic energy ray, processes for the production thereof, and curable compositions KANAGAWA UNIVERSITY (JP) 2005-06-14 US disclosed
US-20050064336-A1 Unsaturated group-containing multi-branched compounds, curable compositions containing the same, and cured products thereof TAIYO INK MANUFACTURING CO., LTD. (JP) 2005-03-24 US disclosed
US-20040039087-A1 Unsaturated polyester compounds, resins curable with actinic energy ray, processes for the production thereof, and curable compositions KANAGAWA UNIVERSITY (JP) 2004-02-26 US disclosed
EP-0816928-B1 A toner image resistant to cracking XEIKON NV (BE) 2001-03-21 EP disclosed
US-5905006-A IMAGES ON SUBSTRATES WITH FINISH LAYERS, PLASTICIZERS AGFA-GEVAERT, N.V. (BE) 1999-05-18 US disclosed
EP-0816928-A2 A toner image resistant to cracking AGFA-GEVAERT N.V. (BE) 1998-01-07 EP disclosed
EP-0199467-B1 POLYESTERS COMPRISING RECURRING PHOTOCONDUCTIVE AND PHOTOCROSSLINKABLE UNITS AND ELEMENTS THEREOF EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-02-08 EP disclosed
EP-0199467-A1 Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1986-10-29 EP disclosed
US-4609606-A LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1986-09-02 US disclosed
EP-0023371-A1 Underwater coating composition ASTRAL Société de Peintures et Vernis (FR) 1981-02-04 EP disclosed
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 US disclosed