SCHEMBL13554306

SCHEMBL13554306

C=C(CC(=O)Oc1ccc2ccc(C)cc2c1)C(=O)OCOC1CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.38
MEN1 O00255 3/20 0.38
MAPT P10636 2/20 0.38
FAAH O00519 1/20 0.38
EPHX1 P07099 1/20 0.38
KDM4E B2RXH2 2/20 0.35
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
RAB9A P51151 1/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
MAOA P21397 1/20 0.34
MAOB P27338 1/20 0.34
NPC1 O15118 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 1/20 0.33
USP2 O75604 1/20 0.33
TP53 P04637 1/20 0.33
TSHR P16473 1/20 0.33
ESR1 P03372 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13555205 0.86 MAPT (0.36) KMT2AMEN1MAPTFAAHEPHX1
SCHEMBL13554302 0.74 TAS1R3 (0.36)
SCHEMBL6519446 0.74 LMNA (0.39) KMT2AMEN1MAPTKDM4ESMN1; SMN2
SCHEMBL6523080 0.73 GAA (0.40) KMT2AMEN1MAPTRAB9AL3MBTL1
SCHEMBL13554308 0.73 NPC1 (0.34) KMT2AMEN1MAPTKDM4EHTT
SCHEMBL13554304 0.71 NAAA (0.40) KMT2AMAPTFAAHEPHX1SMN1; SMN2
SCHEMBL6520983 0.70 KMT2A (0.42) KMT2AMEN1HTTSMN1; SMN2L3MBTL1
SCHEMBL13554293 0.70 NAAA (0.35) EPHX1SMN1; SMN2ALDH1A1TP53
SCHEMBL13554307 0.70 TDP1 (0.36) KMT2AMAPTKDM4EL3MBTL1NPC1
SCHEMBL6515222 0.69 LMNA (0.43) KMT2AMEN1MAPTL3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005874-B2 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-04-14 US disclosed
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-10-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120270155-A1 COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN ASIC1, FGFR1, FGF1 KMT2A 1431/4885MEN1 137/4885MAPT 4510/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.