SCHEMBL13601076

SCHEMBL13601076

Nc1ccc(C(=O)Nc2cc(NC(=O)c3ccc(N)cc3)c(O)cc2O)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 3/20 0.63
MEN1 O00255 3/20 0.58
KMT2A Q03164 3/20 0.58
LMNA P02545 1/20 0.58
POLB P06746 1/20 0.58
PKM P14618 1/20 0.58
APEX1 P27695 1/20 0.58
TDP1 Q9NUW8 1/20 0.58
MAPT P10636 5/20 0.53
GAA P10253 2/20 0.53
SNCA P37840 1/20 0.53
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA9 Q16790 1/20 0.50
MAPK1 P28482 1/20 0.50
CYP1A2 P05177 1/20 0.49
CYP2C9 P11712 1/20 0.49
CYP2C19 P33261 1/20 0.49
KDM4E B2RXH2 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16444808 0.94 HDAC1 (0.65) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL19986268 0.89 HDAC1 (0.60) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL18360434 0.88 HDAC1 (0.58) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL2605585 0.87 HDAC1 (0.70) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL31499393 0.84 HDAC1 (0.67) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL13601067 0.84 HDAC1 (0.86) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL13601069 0.84 HDAC1 (0.67) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL8978690 0.84 HDAC1 (0.67) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL13958489 0.83 MEN1 (0.66) HDAC1MEN1KMT2ALMNAPOLB
SCHEMBL2605547 0.81 KCNMA1 (0.64) HDAC1MEN1KMT2ALMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11860538-B2 Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device FUJIFILM CORPORATION (JP) 2024-01-02 US disclosed
US-11860538-B2 Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device FUJIFILM CORPORATION (JP) 2024-01-02 US disclosed
US-11802181-B2 Di-amine compound, and heat-resistant resin and resin composition using the same TORAY INDUSTRIES, INC. (JP) 2023-10-31 US disclosed
WO-2023182041-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT USING SAME 東レ株式会社 2023-09-28 WO disclosed
WO-2023148996-A1 RESIN COMPOSITION, RESIN COMPOSITION COATING, RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT 東レ株式会社 2023-08-10 WO disclosed
WO-2023139814-A1 RESIN COMPOSITION, FILM, CURED MEMBRANE, SEMICONDUCTOR DEVICE, AND MULTILAYER CIRCUIT BOARD 東レ株式会社 2023-07-27 WO disclosed
US-20230141241-A1 SCINTILLATOR PANEL AND SCINTILLATOR PANEL MANUFACTURING METHOD TORAY INDUSTRIES, INC. (JP) 2023-05-11 US disclosed
US-11567405-B2 Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device FUJIFILM CORPORATION (JP) 2023-01-31 US disclosed
US-20220171285-A1 METHOD OF MANUFACTURING CURED FILM, PHOTOCURABLE RESIN COMPOSITION, METHOD OF MANUFACTURING LAMINATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2022-06-02 US disclosed
US-11347146-B2 Resin composition TORAY INDUSTRIES, INC. (JP) 2022-05-31 US disclosed
WO-2017002859-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, CURED FILM PRODUCTION METHOD AND SEMICONDUCTOR DEVICE 富士フイルム株式会社 2017-01-05 WO disclosed
EP-1744213-B1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT HITACHI CHEM DUPONT MICROSYS (JP) 2014-09-03 EP disclosed
EP-2469337-B1 Positive photosensitive resin composition, method for forming pattern, and electronic component HITACHI CHEM DUPONT MICROSYS (JP) 2014-01-22 EP disclosed
US-7638254-B2 Positive photosensitive resin composition, method for forming pattern, and electronic part HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) 2009-12-29 US disclosed
US-7638254-B2 Positive photosensitive resin composition, method for forming pattern, and electronic part HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD (JP) 2009-12-29 US disclosed
US-7435525-B2 Positive photosensitive resin composition, method for forming pattern, and electronic part HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2008-10-14 US disclosed
US-7435525-B2 Positive photosensitive resin composition, method for forming pattern, and electronic part HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2008-10-14 US disclosed
US-20070122733-A1 Positive photosensitive resin composition, method for forming pattern, and electronic part HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2007-05-31 US disclosed
US-20070122733-A1 Positive photosensitive resin composition, method for forming pattern, and electronic part HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2007-05-31 US disclosed
EP-1744213-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ELECTRONIC COMPONENT Hitachi Chemical DuPont Microsystems Ltd. (JP) 2007-01-17 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11802181-B2 Di-amine compound, and heat-resistant resin and resin composition using the same CAD, ARID2, SMC3 HDAC1 1226/4885MEN1 4033/4885KMT2A 1021/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.