SCHEMBL13683044

SCHEMBL13683044

CCC(C)C(=O)OCCOCOc1ccccc1Cl

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 5/20 0.47
HPGD P15428 4/20 0.44
KMT2A Q03164 5/20 0.43
MEN1 O00255 4/20 0.43
PKM P14618 1/20 0.43
POLB P06746 1/20 0.42
PPARG P37231 1/20 0.42
PPARD Q03181 1/20 0.42
PPARA Q07869 1/20 0.42
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
TSHR P16473 1/20 0.40
MAPT P10636 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
RXRA P19793 1/20 0.38
RXRB P28702 1/20 0.38
KCNH2 Q12809 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683057 0.83 PTGS2 (0.41) L3MBTL1HPGDKMT2AMEN1TSHR
SCHEMBL13683065 0.82 KDM4E (0.54) L3MBTL1KMT2AMEN1PKMMAPT
SCHEMBL13683026 0.82 TDP1 (0.46) HPGDKMT2AMEN1PKMNPC1
SCHEMBL13683047 0.80 CYP1A2 (0.42) L3MBTL1KMT2AMEN1POLBPPARG
SCHEMBL13683054 0.77 MAPT (0.48) PKMPPARGPPARDPPARANPC1
SCHEMBL13683045 0.77 HTT (0.49) KMT2AMEN1PKMPPARGPPARD
SCHEMBL12032774 0.76 TDP1 (0.49) HPGDKMT2AMEN1PKMNPC1
SCHEMBL19680357 0.76 TDP1 (0.49) HPGDKMT2AMEN1PKMNPC1
SCHEMBL13683061 0.75 PPARG (0.48) KMT2AMEN1POLBPPARGPPARD
SCHEMBL13683040 0.75 MEN1 (0.48) L3MBTL1HPGDKMT2AMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed