Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | PTGES | O14684 | 1/20 | 0.38 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
| ▸ | PPARA | Q07869 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | TRPM8 | Q7Z2W7 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683048 | 0.88 | LTA4H (0.41) | MEN1KMT2ATDP1ALDH1A1SMN1; SMN2 | |
| SCHEMBL13683047 | 0.87 | CYP1A2 (0.42) | MEN1KMT2AL3MBTL1NPC1ALDH1A1 | |
| SCHEMBL13683026 | 0.87 | TDP1 (0.46) | MEN1KMT2ATDP1NPC1HPGD | |
| SCHEMBL13683038 | 0.86 | L3MBTL1 (0.52) | KMT2AL3MBTL1TDP1HPGDSMN1; SMN2 | |
| SCHEMBL13683054 | 0.85 | MAPT (0.48) | NPC1SMN1; SMN2MAPTPTGESALOX5 | |
| SCHEMBL12347969 | 0.84 | MEN1 (0.56) | MEN1KMT2AL3MBTL1TDP1NPC1 | |
| SCHEMBL13683061 | 0.82 | PPARG (0.48) | MEN1KMT2ATDP1NPC1ALDH1A1 | |
| SCHEMBL25493417 | 0.82 | L3MBTL1 (0.48) | MEN1KMT2AL3MBTL1TDP1NPC1 | |
| SCHEMBL25821476 | 0.80 | KMT2A (0.43) | MEN1KMT2AL3MBTL1TDP1NPC1 | |
| SCHEMBL13683050 | 0.80 | CHRNB2 (0.43) | L3MBTL1TDP1ALDH1A1SMN1; SMN2KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |