SCHEMBL13683047

SCHEMBL13683047

CCC(C)C(=O)OCCOCOc1ccc(Cl)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.42
CYP3A4 P08684 2/20 0.42
CYP2C19 P33261 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.41
MEN1 O00255 2/20 0.41
ALDH1A1 P00352 2/20 0.41
KMT2A Q03164 2/20 0.41
PMP22 Q01453 2/20 0.41
RAB9A P51151 1/20 0.41
BLM P54132 1/20 0.41
HRH3 Q9Y5N1 1/20 0.41
MAPT P10636 2/20 0.40
NPC1 O15118 1/20 0.39
ABCB11 O95342 2/20 0.38
PPARA Q07869 2/20 0.38
MAOA P21397 1/20 0.38
MAOB P27338 1/20 0.38
TSHR P16473 1/20 0.38
HTR2A P28223 1/20 0.38
MAPK1 P28482 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683048 0.87 LTA4H (0.41) CYP1A2CYP2C19MEN1ALDH1A1KMT2A
SCHEMBL13683040 0.87 MEN1 (0.48) L3MBTL1MEN1ALDH1A1KMT2AMAPT
SCHEMBL13683045 0.85 HTT (0.49) MEN1KMT2ARAB9ANPC1PPARG
SCHEMBL12347963 0.85 ABCB11 (0.48) CYP1A2CYP3A4CYP2C19L3MBTL1MEN1
SCHEMBL13683026 0.85 TDP1 (0.46) MEN1ALDH1A1KMT2ARAB9ANPC1
SCHEMBL13683054 0.83 MAPT (0.48) CYP1A2CYP2C19RAB9AMAPTNPC1
SCHEMBL13683061 0.81 PPARG (0.48) MEN1ALDH1A1KMT2ARAB9AMAPT
SCHEMBL13683044 0.80 L3MBTL1 (0.47) L3MBTL1MEN1ALDH1A1KMT2ARAB9A
SCHEMBL13683038 0.80 L3MBTL1 (0.52) L3MBTL1KMT2APPARALMNAPPARG
SCHEMBL13683050 0.79 CHRNB2 (0.43) CYP3A4L3MBTL1ALDH1A1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed