SCHEMBL13683057

SCHEMBL13683057

CCC(C)C(=O)OCCOCOc1ccccc1OC(C)=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 11/20 0.41
KDM4E B2RXH2 5/20 0.39
KMT2A Q03164 3/20 0.39
MEN1 O00255 2/20 0.39
HPGD P15428 2/20 0.39
HSD17B10 Q99714 2/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
ALDH1A1 P00352 2/20 0.38
LMNA P02545 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ESR1 P03372 1/20 0.37
ITGB3 P05106 1/20 0.37
ITGA2B P08514 1/20 0.37
HMGB1 P09429 1/20 0.37
TSHR P16473 1/20 0.37
GGT1 P19440 1/20 0.37
PTGS1 P23219 1/20 0.37
BLM P54132 1/20 0.37
NAPRT Q6XQN6 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683044 0.83 L3MBTL1 (0.47) KDM4EKMT2AMEN1HPGDL3MBTL1
SCHEMBL13683065 0.81 KDM4E (0.54) KDM4EKMT2AMEN1L3MBTL1ALDH1A1
SCHEMBL13683026 0.81 TDP1 (0.46) KDM4EKMT2AMEN1HPGDHSD17B10
SCHEMBL15547525 0.80 PTGS2 (0.47) PTGS2KDM4EKMT2AMEN1HPGD
SCHEMBL13683053 0.79 PTGS2 (0.38) PTGS2KDM4EHPGDHSD17B10ALDH1A1
SCHEMBL13683054 0.76 MAPT (0.48) SMN1; SMN2
SCHEMBL19680357 0.75 TDP1 (0.49) KDM4EKMT2AMEN1HPGDHSD17B10
SCHEMBL12032774 0.75 TDP1 (0.49) KDM4EKMT2AMEN1HPGDHSD17B10
SCHEMBL13683061 0.74 PPARG (0.48) KDM4EKMT2AMEN1NPSR1ALDH1A1
SCHEMBL13683040 0.74 MEN1 (0.48) KDM4EKMT2AMEN1HPGDL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed