Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.45 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.44 |
| ▸ | PPARG | P37231 | 1/20 | 0.44 |
| ▸ | PPARD | Q03181 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683038 | 0.87 | L3MBTL1 (0.52) | PPARGKMT2ATDP1 | |
| SCHEMBL13683050 | 0.86 | CHRNB2 (0.43) | KDM4ETDP1 | |
| SCHEMBL13683047 | 0.85 | CYP1A2 (0.42) | PPARGMEN1NPC1RAB9AKMT2A | |
| SCHEMBL13683026 | 0.85 | TDP1 (0.46) | KDM4EFFAR1MEN1NPC1RAB9A | |
| SCHEMBL13683063 | 0.84 | RXRA (0.46) | FFAR1 | |
| SCHEMBL13683061 | 0.81 | PPARG (0.48) | HTTKDM4EPPARGPPARDMEN1 | |
| SCHEMBL10030192 | 0.80 | L3MBTL1 (0.50) | HTTKDM4EKMT2ATDP1 | |
| SCHEMBL13683040 | 0.79 | MEN1 (0.48) | KDM4EPPARGMEN1NPC1KMT2A | |
| SCHEMBL13683048 | 0.79 | LTA4H (0.41) | KDM4EMEN1KMT2ATDP1 | |
| SCHEMBL13683054 | 0.78 | MAPT (0.48) | FFAR1PPARGPPARDNPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |