SCHEMBL13683053

SCHEMBL13683053

CCC(C)(C)C(=O)OCCOCOc1ccccc1OC(C)=O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 13/20 0.38
KDM4E B2RXH2 2/20 0.37
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
TDP1 Q9NUW8 3/20 0.36
ESR1 P03372 1/20 0.36
ITGB3 P05106 1/20 0.36
ITGA2B P08514 1/20 0.36
HMGB1 P09429 1/20 0.36
HPGD P15428 1/20 0.36
TSHR P16473 1/20 0.36
GGT1 P19440 1/20 0.36
PTGS1 P23219 1/20 0.36
BLM P54132 1/20 0.36
NAPRT Q6XQN6 1/20 0.36
HSD17B10 Q99714 1/20 0.36
PTPN1 P18031 1/20 0.36
CHRM2 P08172 1/20 0.35
CHRM4 P08173 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683036 0.85 TDP1 (0.48) KDM4EALDH1A1LMNASMN1; SMN2TDP1
SCHEMBL13683042 0.85 GAA (0.41) KDM4EALDH1A1LMNASMN1; SMN2TDP1
SCHEMBL13683051 0.83 ELANE (0.40) ALDH1A1LMNAESR1TSHRHSD17B10
SCHEMBL14582691 0.82 ALDH1A1 (0.54) PTGS2KDM4EALDH1A1LMNASMN1; SMN2
SCHEMBL13683064 0.81 KDM4E (0.45) KDM4EALDH1A1TDP1HPGDTSHR
SCHEMBL13683041 0.81 TDP1 (0.44) KDM4ESMN1; SMN2TDP1TSHRCHRM2
SCHEMBL13683049 0.81 CYP3A4 (0.43) KDM4EALDH1A1LMNASMN1; SMN2TDP1
SCHEMBL13683057 0.79 PTGS2 (0.41) PTGS2KDM4EALDH1A1LMNASMN1; SMN2
SCHEMBL13683058 0.77 NPC1 (0.46) LMNASMN1; SMN2
SCHEMBL18219828 0.76 KDM4E (0.48) KDM4EALDH1A1LMNASMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed