Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXRA | P19793 | 2/20 | 0.46 |
| ▸ | RXRB | P28702 | 2/20 | 0.46 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.44 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.44 |
| ▸ | FFAR4 | Q5NUL3 | 4/20 | 0.43 |
| ▸ | FFAR1 | O14842 | 3/20 | 0.43 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.41 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.41 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.41 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.41 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.41 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.41 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.41 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.41 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.40 |
| ▸ | SLC13A5 | Q86YT5 | 2/20 | 0.40 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683054 | 0.90 | MAPT (0.48) | HDAC1HDAC2FFAR1HDAC3HDAC4 | |
| SCHEMBL13683026 | 0.90 | TDP1 (0.46) | FFAR1 | |
| SCHEMBL13683038 | 0.86 | L3MBTL1 (0.52) | — | |
| SCHEMBL13683050 | 0.85 | CHRNB2 (0.43) | — | |
| SCHEMBL13683045 | 0.84 | HTT (0.49) | FFAR1 | |
| SCHEMBL13683061 | 0.82 | PPARG (0.48) | HDAC1 | |
| SCHEMBL12159342 | 0.82 | RARB (0.52) | HDAC1HDAC2HDAC3HDAC4HDAC7 | |
| SCHEMBL19680357 | 0.82 | TDP1 (0.49) | — | |
| SCHEMBL12032774 | 0.82 | TDP1 (0.49) | — | |
| SCHEMBL6721427 | 0.80 | THRB (0.53) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |