Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 1/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.38 |
| ▸ | CNR1 | P21554 | 2/20 | 0.38 |
| ▸ | CNR2 | P34972 | 2/20 | 0.38 |
| ▸ | APP | P05067 | 1/20 | 0.37 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.37 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683038 | 0.88 | L3MBTL1 (0.52) | TDP1L3MBTL1SMN1; SMN2 | |
| SCHEMBL13683026 | 0.86 | TDP1 (0.46) | TDP1MTNR1AMTNR1BTSHRSMN1; SMN2 | |
| SCHEMBL13683045 | 0.86 | HTT (0.49) | TDP1KDM4E | |
| SCHEMBL13683048 | 0.85 | LTA4H (0.41) | TDP1MAPK1TSHRSMN1; SMN2ALDH1A1 | |
| SCHEMBL13683063 | 0.85 | RXRA (0.46) | — | |
| SCHEMBL13683061 | 0.82 | PPARG (0.48) | TDP1MAPK1SMN1; SMN2ALDH1A1KDM4E | |
| SCHEMBL10030192 | 0.81 | L3MBTL1 (0.50) | TDP1L3MBTL1MAPK1MTNR1AMTNR1B | |
| SCHEMBL13683040 | 0.80 | MEN1 (0.48) | TDP1L3MBTL1TSHRSMN1; SMN2ALDH1A1 | |
| SCHEMBL13683043 | 0.80 | CHRNB2 (0.43) | CHRNB2CHRNA4CYP3A4TDP1L3MBTL1 | |
| SCHEMBL13683054 | 0.79 | MAPT (0.48) | SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |