Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.43 |
| ▸ | PPARG | P37231 | 1/20 | 0.43 |
| ▸ | PPARA | Q07869 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.41 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | DRD2 | P14416 | 1/20 | 0.41 |
| ▸ | DRD4 | P21917 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683050 | 0.88 | CHRNB2 (0.43) | L3MBTL1TDP1SMN1; SMN2 | |
| SCHEMBL13683026 | 0.88 | TDP1 (0.46) | TDP1SMN1; SMN2KMT2ALMNAHPGD | |
| SCHEMBL13683045 | 0.87 | HTT (0.49) | TDP1PPARGKMT2A | |
| SCHEMBL13683040 | 0.86 | MEN1 (0.48) | L3MBTL1TDP1SMN1; SMN2ALOX5PPARG | |
| SCHEMBL13683063 | 0.86 | RXRA (0.46) | — | |
| SCHEMBL13683061 | 0.83 | PPARG (0.48) | TDP1SMN1; SMN2PPARGPPARAPOLB | |
| SCHEMBL10030192 | 0.82 | L3MBTL1 (0.50) | L3MBTL1TDP1SMN1; SMN2KMT2ALMNA | |
| SCHEMBL13683048 | 0.81 | LTA4H (0.41) | TDP1SMN1; SMN2KMT2ALMNA | |
| SCHEMBL13683054 | 0.80 | MAPT (0.48) | SMN1; SMN2ALOX5PPARGPPARAGAA | |
| SCHEMBL12755247 | 0.80 | L3MBTL1 (0.60) | L3MBTL1TDP1SMN1; SMN2POLBADRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |