Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.45 |
| ▸ | HPGD | P15428 | 3/20 | 0.45 |
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | HTR1B | P28222 | 6/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.42 |
| ▸ | OGG1 | O15527 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | HTR1D | P28221 | 2/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683042 | 0.84 | GAA (0.41) | KDM4EALDH1A1HPGDTDP1ATM | |
| SCHEMBL13683036 | 0.84 | TDP1 (0.48) | KDM4EALDH1A1TDP1KMT2AMEN1 | |
| SCHEMBL13683053 | 0.81 | PTGS2 (0.38) | KDM4EALDH1A1HPGDTSHRTDP1 | |
| SCHEMBL14582691 | 0.81 | ALDH1A1 (0.54) | KDM4EALDH1A1HPGDTSHRTDP1 | |
| SCHEMBL13683041 | 0.80 | TDP1 (0.44) | KDM4ETSHRTDP1 | |
| SCHEMBL13683066 | 0.79 | PPARG (0.47) | KDM4EALDH1A1TDP1KMT2AMEN1 | |
| SCHEMBL13568054 | 0.78 | NR2E1 (0.57) | KDM4EALDH1A1TSHRTDP1HSD17B10 | |
| SCHEMBL7265465 | 0.77 | ALDH1A1 (0.54) | KDM4EALDH1A1HPGDTSHRTDP1 | |
| SCHEMBL19360473 | 0.77 | KDM4E (0.47) | KDM4EALDH1A1HPGDTDP1KMT2A | |
| SCHEMBL29448816 | 0.76 | KDM4E (0.54) | KDM4EALDH1A1HPGDTSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |