SCHEMBL13683036

SCHEMBL13683036

CCC(C)(C)C(=O)OCCOCOc1ccccc1C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.48
ALDH1A1 P00352 4/20 0.42
KDM4E B2RXH2 3/20 0.42
HTT P42858 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
NPC1 O15118 1/20 0.41
LMNA P02545 1/20 0.41
MAPT P10636 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
RXRA P19793 1/20 0.38
RXRB P28702 1/20 0.38
RXRG P48443 1/20 0.38
NOTUM Q6P988 1/20 0.38
SSTR1 P30872 1/20 0.37
SSTR4 P31391 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
TP53 P04637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683042 0.87 GAA (0.41) TDP1ALDH1A1KDM4EL3MBTL1LMNA
SCHEMBL13683053 0.85 PTGS2 (0.38) TDP1ALDH1A1KDM4ELMNASMN1; SMN2
SCHEMBL14582691 0.85 ALDH1A1 (0.54) TDP1ALDH1A1KDM4EHTTL3MBTL1
SCHEMBL13683064 0.84 KDM4E (0.45) TDP1ALDH1A1KDM4EMEN1KMT2A
SCHEMBL13683041 0.83 TDP1 (0.44) TDP1KDM4ENPC1RAB9ASMN1; SMN2
SCHEMBL1108095 0.80 TDP1 (0.48) TDP1ALDH1A1KDM4EL3MBTL1NPC1
SCHEMBL13683037 0.80 MEN1 (0.47) ALDH1A1L3MBTL1NPC1LMNAMAPT
SCHEMBL13683058 0.79 NPC1 (0.46) NPC1LMNAMAPTRAB9ASMN1; SMN2
SCHEMBL18219828 0.78 KDM4E (0.48) TDP1ALDH1A1KDM4ENPC1LMNA
SCHEMBL11306567 0.78 KDM4E (0.48) TDP1ALDH1A1KDM4ENPC1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed