Known targets — ChEMBL curated mechanism
MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.77 |
| ▸ | LMNA | P02545 | 2/20 | 0.59 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.53 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | THPO | P40225 | 1/20 | 0.43 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 1/20 | 0.41 |
| ▸ | PAOX | Q6QHF9 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 2/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | FFAR3 | O14843 | 3/20 | 0.37 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28060459 | 0.88 | ALDH1A1 (1.00) | ALDH1A1LMNASLC15A2TDP1TSHR | |
| SCHEMBL10001 | 0.88 | — | — | |
| Levulinic Acid SCHEMBL27736725 | 0.87 | LMNA (0.82) | ALDH1A1LMNASLC15A2TDP1TSHR | |
| Alcohol SCHEMBL170693 | 0.86 | — | — | |
| Alcohol SCHEMBL6384641 | 0.86 | — | — | |
| SCHEMBL9856678 | 0.85 | ALDH1A1 (0.77) | ALDH1A1LMNASLC15A2TDP1TSHR | |
| SCHEMBL27722569 | 0.84 | — | — | |
| SCHEMBL27584016 | 0.84 | — | — | |
| SCHEMBL11615492 | 0.84 | — | — | |
| SCHEMBL6801343 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1142 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025032169-A1 | POSITIVE TONE PATTERNS FROM METAL ORGANIC RESISTS | MERCK PATENT GMBH (DE) | 2025-02-13 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| US-20200183284-A1 | METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST | YCCHEM CO., LTD. (KR) | 2020-06-11 | — | — | US | claimed |
| US-20200110339-A1 | PHOTORESIST PATTERN SHRINKING COMPOSITION AND PATTERN SHRINKING METHOD | YCCHEM CO., LTD. (KR) | 2020-04-09 | — | — | US | claimed |
| US-20190137880-A1 | METHOD AND COMPOSITION FOR IMPROVING LWR IN PATTERNING STEP USING NEGATIVE TONE PHOTORESIST | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2019-05-09 | — | — | US | claimed |
| US-12638768-B2 | Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2026-05-26 | — | — | US | disclosed |
| US-20260140447-A1 | COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2026-05-21 | — | — | US | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| WO-2026100268-A1 | NEGATIVE PHOTOSENSITIVE FILM, MULTILAYER FILM, DRY FILM, AND NEGATIVE PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12619147-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2026-05-05 | — | — | US | disclosed |
| US-20260118759-A1 | COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORP (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-2003504-A2 | Method of forming patterns | FUJIFILM Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-20080261150-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1980911-A2 | Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method | FUJIFILM Corporation (JP) | 2008-10-15 | — | — | EP | disclosed |
| US-20080187860-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| EP-1939691-A2 | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | FUJIFILM Corporation (JP) | 2008-07-02 | — | — | EP | disclosed |
| US-20080114115-A1 | Composition for forming coating and coating formed of composition | TOKYO OHKA KOGYO CO., LTD | 2008-05-15 | — | — | US | disclosed |
| US-4480133-A | Chemical process | ETHYL CORPORATION (US) | 1984-10-30 | — | — | US | disclosed |
| US-4353897-A | INSECTICIDES, MITICIDES | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-10-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | ALDH1A1 1639/4885LMNA 1064/4885SLC15A2 2464/4885 |
| US-20260140447-A1 | COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | RER1, C1R, H1-2 | ALDH1A1 2808/4885LMNA 2009/4885SLC15A2 4436/4885 |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | ALDH1A1 2680/4885LMNA 3028/4885SLC15A2 4542/4885 |
| US-20260118759-A1 | COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | RER1, H1-2, TSHR | ALDH1A1 4214/4885LMNA 3402/4885SLC15A2 4193/4885 |
| US-12638768-B2 | Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and method for manufacturing electronic device | LCP1, ACTN1, ARCN1 | ALDH1A1 2739/4885LMNA 542/4885SLC15A2 3548/4885 |
| US-12619147-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device | RAD51, COL1A1, CROCC | ALDH1A1 1614/4885LMNA 122/4885SLC15A2 4538/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.