SCHEMBL14760451

SCHEMBL14760451

O=C(OCCC(F)(F)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)C1CCC(OC(=O)C(F)(F)F)CC1

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.37
MEN1 O00255 1/20 0.37
CYP2C19 P33261 1/20 0.35
PKM P14618 3/20 0.33
HTR7 P34969 2/20 0.32
HTR1A P08908 1/20 0.32
DRD2 P14416 1/20 0.32
HTR2A P28223 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
ALDH1A1 P00352 2/20 0.32
TP53 P04637 1/20 0.32
MAPT P10636 1/20 0.32
TSHR P16473 1/20 0.32
HSD17B10 Q99714 1/20 0.32
FKBP1A P62942 1/20 0.31
TAS2R14 Q9NYV8 2/20 0.31
LMNA P02545 1/20 0.31
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14760462 0.85 KMT2A (0.41) KMT2AMEN1CYP2C19PKMHTR7
SCHEMBL16205017 0.79 FKBP1A (0.40) KMT2AMEN1CYP2C19HTR7HTR1A
SCHEMBL14774016 0.79
SCHEMBL4268824 0.76 HSD11B1 (0.37) KMT2AMEN1CYP2C19ALDH1A1MAPT
SCHEMBL1656675 0.74 TDP1 (0.44) KMT2AHTR1AHTR2ANPSR1ALDH1A1
SCHEMBL2887917 0.72 ALDH1A1 (0.45) KMT2ACYP2C19ALDH1A1TSHRLMNA
SCHEMBL246596 0.72 HTT (0.35) KMT2AMEN1CYP2C19ALDH1A1MAPT
SCHEMBL3756015 0.71 MEN1 (0.44) KMT2AMEN1CYP2C19PKMHTR7
SCHEMBL14760503 0.70 ALDH1A1 (0.35) KMT2AMEN1NPSR1ALDH1A1TP53
SCHEMBL1656350 0.70 HSD11B1 (0.38) KMT2AMEN1CYP2C19ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, RXRG KMT2A 4267/4885MEN1 3808/4885CYP2C19 2080/4885
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, FPR3 KMT2A 4261/4885MEN1 3872/4885CYP2C19 2077/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.