SCHEMBL14768871

SCHEMBL14768871

O=C(OCc1ccccc1)c1nc(C(=O)OCc2ccccc2)nc(C(=O)OCc2ccccc2)n1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.66
KMT2A Q03164 2/20 0.66
SLC6A2 P23975 1/20 0.66
SLC6A3 Q01959 1/20 0.66
ALDH1A1 P00352 6/20 0.59
LMNA P02545 2/20 0.59
MAPT P10636 1/20 0.56
HPGD P15428 1/20 0.56
L3MBTL1 Q9Y468 3/20 0.55
MAPK1 P28482 2/20 0.55
TSHR P16473 3/20 0.53
POLB P06746 1/20 0.53
MMP2 P08253 2/20 0.51
MMP9 P14780 2/20 0.51
MMP12 P39900 2/20 0.51
MMP1 P03956 1/20 0.51
ADORA3 P0DMS8 1/20 0.50
RAB9A P51151 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
EGLN1 Q9GZT9 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19996729 0.91 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL19820133 0.91 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL19928471 0.91 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL26491203 0.91 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL19902247 0.90 TDP1 (0.54) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL21538018 0.88 TDP1 (0.66) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL18608206 0.88 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL20348533 0.88 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL19463514 0.88 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1
SCHEMBL19779304 0.88 TDP1 (0.56) TDP1KMT2ASLC6A2SLC6A3ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11358941-B2 2022-06-14 US disclosed
US-11215928-B2 Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate JSR CORPORATION (JP) 2022-01-04 US disclosed
US-11003079-B2 Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound JSR CORPORATION (JP) 2021-05-11 US disclosed
US-20200361879-A1 COMPOUNDS HAVING A STABILIZING EFFECT, METHOD FOR PRODUCING SAID COMPOUNDS, COMPOSITION CONTAINING SAID STABILIZING COMPOUNDS, METHOD FOR STABILIZING AN ORGANIC COMPONENT, AND USE OF STABILIZING COMPOUNDS Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. (DE) 2020-11-19 US disclosed
US-10683455-B2 Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same POLNOX CORPORATION (US) 2020-06-16 US disclosed
US-20190292454-A1 Macromolecular Antioxidants Based On Dual Type Moiety Per Molecule: Structures, Methods Of Making And Using The Same POLNOX CORPORATION 2019-09-26 US disclosed
US-20190212650-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR FORMING THE SAME, AND PRODUCTION METHOD OF A PATTERNED SUBSTRATE JSR CORPORATION (JP) 2019-07-11 US disclosed
US-10294423-B2 Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same POLNOX CORPORATION (US) 2019-05-21 US disclosed
US-20190094695-A1 COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2019-03-28 US disclosed
US-20130065030-A1 Dispersion, process for preparing a dispersion and ink jet printing ink FUJIFILM IMAGING COLORANTS LIMITED (GB) 2013-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190094695-A1 COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND RER1, TOP1, RIF1 TDP1 1701/4885KMT2A 593/4885SLC6A2 1581/4885
US-10683455-B2 Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same LPO, GPX4, DUOX2 TDP1 1052/4885KMT2A 3358/4885SLC6A2 3418/4885
US-11003079-B2 Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound RER1, TOP1, RIF1 TDP1 1701/4885KMT2A 593/4885SLC6A2 1581/4885
US-20190292454-A1 Macromolecular Antioxidants Based On Dual Type Moiety Per Molecule: Structures, Methods Of Making And Using The Same LPO, GPX4, DUOX2 TDP1 1052/4885KMT2A 3358/4885SLC6A2 3418/4885
US-11358941-B2 OGG1, SOD1, ERCC5 TDP1 319/4885KMT2A 3779/4885SLC6A2 3714/4885
US-20200361879-A1 COMPOUNDS HAVING A STABILIZING EFFECT, METHOD FOR PRODUCING SAID COMPOUNDS, COMPOSITION CONTAINING SAID STABILIZING COMPOUNDS, METHOD FOR STABILIZING AN ORGANIC COMPONENT, AND USE OF STABILIZING COMPOUNDS OGG1, SOD1, AOX1 TDP1 962/4885KMT2A 3448/4885SLC6A2 4176/4885
US-10294423-B2 Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same LPO, GPX4, DUOX2 TDP1 913/4885KMT2A 3409/4885SLC6A2 3370/4885
US-11215928-B2 Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate TOP1, OXA1L, RER1 TDP1 1554/4885KMT2A 795/4885SLC6A2 1219/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.