SCHEMBL1484264

SCHEMBL1484264

O=S(=O)(OCC(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 4/20 0.40
CA1 P00915 3/20 0.38
HSD11B1 P28845 4/20 0.33
PSIP1 O75475 1/20 0.32
HTR6 P50406 1/20 0.32
APOBEC3G Q9HC16 1/20 0.32
NR1H3 Q13133 4/20 0.31
NR1I2 O75469 3/20 0.31
RORC P51449 3/20 0.31
RORA P35398 2/20 0.31
NR1H2 P55055 2/20 0.31
RORB Q92753 2/20 0.31
NR1H4 Q96RI1 2/20 0.31
ALDH1A1 P00352 2/20 0.31
MAPT P10636 1/20 0.31
RXRA P19793 1/20 0.31
SREBF1 P36956 1/20 0.31
PSEN1 P49768 1/20 0.31
PSEN2 P49810 1/20 0.31
NR1I3 Q14994 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL37033 0.82 HTR6 (0.42) CA2CA1HSD11B1PSIP1HTR6
SCHEMBL1483806 0.82 CA2 (0.36) CA2CA1HSD11B1RORCALDH1A1
SCHEMBL2475714 0.82 BCHE (0.38) CA2CA1HSD11B1ALDH1A1MAPT
SCHEMBL501412 0.80 HSD11B1 (0.38) HSD11B1PSIP1HTR6NR1H3NR1I2
SCHEMBL962839 0.78 HSD11B1 (0.41) CA2CA1HSD11B1HTR6APOBEC3G
SCHEMBL501907 0.77 HSD11B1 (0.40) HSD11B1NR1I2ALDH1A1MAPTHSD17B10
SCHEMBL543695 0.76 ALDH1A1 (0.43) PSIP1ALDH1A1TDP1TSHR
SCHEMBL16893270 0.75 HSD11B1 (0.32) HSD11B1ALDH1A1
SCHEMBL246811 0.75 KMT2A (0.36) HSD11B1NR1I2ALDH1A1MAPTHSD17B10
SCHEMBL503373 0.75 PKM (0.46) HSD11B1RORCALDH1A1HSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8940471-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-01-27 US disclosed
US-20110076615-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-03-31 US disclosed