Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.40 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.40 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | RORC | P51449 | 2/20 | 0.38 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3130157 | 1.00 | PKM (0.46) | PKMFFAR1FFAR4HSD11B1KMT2A | |
| SCHEMBL503330 | 0.94 | HSD11B1 (0.42) | PKMFFAR1FFAR4HSD11B1KMT2A | |
| SCHEMBL37033 | 0.91 | HTR6 (0.42) | HSD11B1TSHRHSD17B10ALDH1A1 | |
| SCHEMBL9135546 | 0.86 | ACHE (0.46) | FFAR4HSD11B1KMT2AMEN1TSHR | |
| SCHEMBL4643793 | 0.86 | CA1 (0.46) | PKMHSD11B1KMT2AMEN1PTGS2 | |
| SCHEMBL3132394 | 0.84 | CA1 (0.42) | PKMFFAR1FFAR4HSD11B1RORC | |
| SCHEMBL1804334 | 0.84 | CA1 (0.42) | PKMFFAR1FFAR4HSD11B1RORC | |
| SCHEMBL36148 | 0.84 | HTT (0.45) | FFAR1HSD11B1KMT2AMEN1ALDH1A1 | |
| SCHEMBL444803 | 0.84 | PTGS2 (0.44) | HSD11B1PTGS2 | |
| SCHEMBL147485 | 0.84 | IDO1 (0.40) | HSD11B1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4693286-A1 | PHOTOSENSITIVE COMPOSITION FOR HOLOGRAM RECORDING, HOLOGRAM RECORDING MEDIUM, POLYMER, LARGE CAPACITY MEMORY, OPTICAL ELEMENT, AR LIGHT GUIDE PLATE, AND AR GLASSES | Mitsubishi Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4692042-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, POLYMER, OPTICAL MATERIAL, AND OPTICAL COMPONENT | Mitsubishi Chemical Corporation (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260028312-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, POLYMER, OPTICAL MATERIAL, AND OPTICAL COMPONENT | MITSUBISHI CHEMICAL CORPORATION (JP) | 2026-01-29 | — | — | US | disclosed |
| US-20260023321-A1 | PHOTOSENSITIVE COMPOSITION FOR HOLOGRAM RECORDING, HOLOGRAM RECORDING MEDIUM, POLYMER, LARGE CAPACITY MEMORY, OPTICAL ELEMENT, AR LIGHT GUIDE PLATE, AND AR GLASSES | MITSUBISHI CHEMICAL CORPORATION (JP) | 2026-01-22 | — | — | US | disclosed |
| EP-4606785-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAM RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | Mitsubishi Chemical Corporation (JP) | 2025-08-27 | — | — | EP | disclosed |
| US-20250206731-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-06-26 | — | — | US | disclosed |
| EP-4549430-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL AND OPTICAL COMPONENT | Mitsubishi Chemical Corporation (JP) | 2025-05-07 | — | — | EP | disclosed |
| US-20250122178-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-04-17 | — | — | US | disclosed |
| EP-4317155-A1 | COMPOUND, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | Mitsubishi Chemical Corporation (JP) | 2024-02-07 | — | — | EP | disclosed |
| US-20240018137-A1 | COMPOUND, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| US-7258962-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-21 | — | — | US | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| US-20060188812-A1 | Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1686424-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-20060166138-A1 | Radiation-sensitive resin composition | JSR CORPORATION | 2006-07-27 | — | — | US | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20050244747-A1 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260028312-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, POLYMER, OPTICAL MATERIAL, AND OPTICAL COMPONENT | CHRM1, CHRM2, NOX1 | PKM 468/4885FFAR1 2113/4885FFAR4 2786/4885 |
| US-20250206731-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | H1-0, H1-3, H1-2 | PKM 750/4885FFAR1 3558/4885FFAR4 3742/4885 |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | ARSA, HAO2, HAO1 | PKM 3805/4885FFAR1 1512/4885FFAR4 3491/4885 |
| US-20250122178-A1 | COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | H1-0, H1-2, CCNB2 | PKM 1107/4885FFAR1 4046/4885FFAR4 4317/4885 |
| US-20240018137-A1 | COMPOUND, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT | F12, SEM1, NOX1 | PKM 1171/4885FFAR1 4157/4885FFAR4 4475/4885 |
| US-20260023321-A1 | PHOTOSENSITIVE COMPOSITION FOR HOLOGRAM RECORDING, HOLOGRAM RECORDING MEDIUM, POLYMER, LARGE CAPACITY MEMORY, OPTICAL ELEMENT, AR LIGHT GUIDE PLATE, AND AR GLASSES | RAD51, NAP1L1, RPA1 | PKM 2972/4885FFAR1 1019/4885FFAR4 3057/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.