Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.42 |
| ▸ | ESR1 | P03372 | 6/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.41 |
| ▸ | HSD17B1 | P14061 | 4/20 | 0.41 |
| ▸ | HSD17B2 | P37059 | 4/20 | 0.41 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.40 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.40 |
| ▸ | CDC25B | P30305 | 1/20 | 0.39 |
| ▸ | NQO2 | P16083 | 1/20 | 0.38 |
| ▸ | GFER | P55789 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | IDH1 | O75874 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25748795 | 0.86 | CYP1A2 (0.46) | TLR8CYP1A2ESR1ESR2HSD17B1 | |
| SCHEMBL1506783 | 0.85 | MCL1 (0.51) | CYP1A2ESR1ESR2PTPN1MCL1 | |
| SCHEMBL23581544 | 0.81 | TLR8 (0.47) | TLR8CYP1A2ESR1ESR2PTPN1 | |
| SCHEMBL1506772 | 0.79 | NQO2 (0.53) | TLR8CYP1A2CDC25BNQO2GFER | |
| SCHEMBL29563474 | 0.78 | PTK2B (0.55) | CYP1A2PTPN1CDC25BCYP3A4CYP2D6 | |
| SCHEMBL273123 | 0.78 | PTK2B (0.55) | CYP1A2PTPN1CDC25BCYP3A4CYP2D6 | |
| SCHEMBL5034603 | 0.77 | CYP1A2 (0.47) | CYP1A2PTPN1CDC25BGAACYP2D6 | |
| SCHEMBL27792854 | 0.77 | CYP1A2 (0.48) | CYP1A2CDC25BCYP2D6 | |
| SCHEMBL31115692 | 0.77 | ALDH1A1 (0.56) | CYP1A2PTPN1CDC25BGAACYP2C19 | |
| SCHEMBL17002609 | 0.77 | ALDH1A1 (0.56) | CYP1A2PTPN1CDC25BGAACYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230205087-A1 | PHOTORESIST UNDERLAYER COMPOSITION | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-06-29 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9182668-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9182668-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9104105-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-9086624-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-21 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110065857-A1 | Fluorine-Containing Polymer and Anti-Static Agent Wherein Same is Used | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| EP-2289954-A1 | FLUORINE-CONTAINING POLYMER AND ANTI-STATIC AGENT WHEREIN SAME IS USED | Central Glass Company, Limited (JP) | 2011-03-02 | — | — | EP | disclosed |
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090011199-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same | FGFR2, RTF1, ADGRF1 | TLR8 3528/4885CYP1A2 3865/4885ESR1 334/4885 |
| US-20110236831-A1 | ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ADH1A, ADH1C, ADH5 | TLR8 3222/4885CYP1A2 355/4885ESR1 2319/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.