Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | GFER | P55789 | 1/20 | 0.37 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.34 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | ACP1 | P24666 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 4/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.33 |
| ▸ | NOX1 | Q9Y5S8 | 2/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21816926 | 0.89 | ALDH1A1 (0.35) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL27902357 | 0.82 | ALDH1A1 (0.35) | ALDH1A1CYP3A4MAPK1L3MBTL1TP53 | |
| SCHEMBL20184783 | 0.79 | TP53 (0.34) | ALDH1A1ALDH3A1ALDH1A3TP53S1PR1 | |
| SCHEMBL350461 | 0.75 | TSHR (0.38) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL2460080 | 0.74 | ACP1 (0.33) | TSHRL3MBTL1CNR2ACP1MAPT | |
| SCHEMBL16167227 | 0.74 | ALDH1A1 (0.43) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL2067322 | 0.72 | TAAR1 (0.34) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL1574035 | 0.67 | ALDH1A1 (0.71) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL4767414 | 0.65 | ALDH1A1 (0.32) | ALDH1A1CYP3A4TSHRMAPK1TDP1 | |
| SCHEMBL18207642 | 0.65 | ALDH1A1 (0.32) | ALDH1A1CYP3A4TSHRMAPK1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3428202-A1 | PROCESS OF PRODUCING POLYOLEFINS USING METALLOCENE POLYMERIZATION CATALYSTS AND COPOLYMERS THEREFROM | ExxonMobil Chemical Patents Inc. (US) | 2019-01-16 | — | — | EP | claimed |
| US-9611348-B2 | Process of producing polyolefins using metallocene polymerization catalysts and copolymers therefrom | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2017-04-04 | — | — | US | claimed |
| EP-2984111-A1 | PROCESS OF PRODUCING POLYOLEFINS USING METALLOCENE POLYMERIZATION CATALYSTS AND COPOLYMERS THEREFROM | ExxonMobil Chemical Patents Inc. (US) | 2016-02-17 | — | — | EP | claimed |
| US-20140316085-A1 | Process of Producing Polyolefins Using Metallocene Polymerization Catalysts and Copolymers Therefrom | EXXONMOBIL CHEMICAL PATENTS INC. | 2014-10-23 | — | — | US | claimed |
| WO-2014169017-A1 | PROCESS OF PRODUCING POLYOLEFINS USING METALLOCENE POLYMERIZATION CATALYSTS AND COPOLYMERS THEREFROM | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2014-10-16 | — | — | WO | claimed |
| US-11548984-B2 | Light- or heat-curing method and curable resin composition | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2023-01-10 | — | — | US | disclosed |
| US-10774062-B2 | Photocuring method, compound and composition used therein | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2020-09-15 | — | — | US | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| EP-3409709-B1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-20200123324-A1 | LIGHT- OR HEAT-CURING METHOD AND CURABLE RESIN COMPOSITION | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190055210-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| EP-3428202-A1 | PROCESS OF PRODUCING POLYOLEFINS USING METALLOCENE POLYMERIZATION CATALYSTS AND COPOLYMERS THEREFROM | ExxonMobil Chemical Patents Inc. (US) | 2019-01-16 | — | — | EP | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3409709-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM Wako Pure Chemical Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-9611348-B2 | Process of producing polyolefins using metallocene polymerization catalysts and copolymers therefrom | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2017-04-04 | — | — | US | disclosed |
| EP-2984111-A1 | PROCESS OF PRODUCING POLYOLEFINS USING METALLOCENE POLYMERIZATION CATALYSTS AND COPOLYMERS THEREFROM | ExxonMobil Chemical Patents Inc. (US) | 2016-02-17 | — | — | EP | disclosed |
| US-20140316085-A1 | Process of Producing Polyolefins Using Metallocene Polymerization Catalysts and Copolymers Therefrom | EXXONMOBIL CHEMICAL PATENTS INC. | 2014-10-23 | — | — | US | disclosed |
| WO-2014169017-A1 | PROCESS OF PRODUCING POLYOLEFINS USING METALLOCENE POLYMERIZATION CATALYSTS AND COPOLYMERS THEREFROM | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2014-10-16 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | ALDH1A1 847/4885CYP3A4 3181/4885TSHR 1154/4885 |
| US-20190055210-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | ESD, TMT1A, PAM | ALDH1A1 23/4885CYP3A4 2435/4885TSHR 4741/4885 |
| US-10774062-B2 | Photocuring method, compound and composition used therein | ESD, TMT1A, PAM | ALDH1A1 23/4885CYP3A4 2435/4885TSHR 4741/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | ALDH1A1 847/4885CYP3A4 3181/4885TSHR 1154/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.