Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 3/20 | 0.33 |
| ▸ | DRD2 | P14416 | 2/20 | 0.33 |
| ▸ | DRD1 | P21728 | 1/20 | 0.33 |
| ▸ | DRD4 | P21917 | 1/20 | 0.33 |
| ▸ | DRD5 | P21918 | 1/20 | 0.33 |
| ▸ | CRHR1 | P34998 | 5/20 | 0.33 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.32 |
| ▸ | ALDH3A1 | P30838 | 2/20 | 0.32 |
| ▸ | ALDH1A3 | P47895 | 2/20 | 0.32 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.32 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.32 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.32 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.32 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.32 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HCAR3 | P49019 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16166997 | 0.79 | ALDH1A1 (0.41) | TP53S1PR1ALDH3A1ALDH1A3ALDH1A1 | |
| SCHEMBL816702 | 0.78 | TP53 (0.34) | TP53DRD3HTR1A | |
| SCHEMBL2462799 | 0.76 | BCHE (0.31) | TP53DRD3CRHR1 | |
| SCHEMBL4723409 | 0.76 | AGTR1 (0.35) | DRD3DRD2HCAR3 | |
| SCHEMBL4719826 | 0.72 | TDP1 (0.35) | CRHR1ALDH1A1OPRM1 | |
| SCHEMBL4722542 | 0.71 | ELANE (0.37) | CRHR1ALDH1A1 | |
| SCHEMBL4720063 | 0.71 | UTS2R (0.35) | S1PR1CRHR1ALDH1A1 | |
| SCHEMBL4722446 | 0.70 | TSHR (0.33) | TP53DRD3ALDH1A1HTR1A | |
| SCHEMBL21816926 | 0.70 | ALDH1A1 (0.35) | S1PR1ALDH1A1 | |
| SCHEMBL4720954 | 0.69 | BCHE (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11548984-B2 | Light- or heat-curing method and curable resin composition | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2023-01-10 | — | — | US | disclosed |
| US-10774062-B2 | Photocuring method, compound and composition used therein | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2020-09-15 | — | — | US | disclosed |
| EP-3409709-B1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-20200123324-A1 | LIGHT- OR HEAT-CURING METHOD AND CURABLE RESIN COMPOSITION | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190055210-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3409709-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM Wako Pure Chemical Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | TP53 4418/4885S1PR1 3651/4885DRD3 711/4885 |
| US-20190055210-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | ESD, TMT1A, PAM | TP53 4324/4885S1PR1 2603/4885DRD3 340/4885 |
| US-10774062-B2 | Photocuring method, compound and composition used therein | ESD, TMT1A, PAM | TP53 4324/4885S1PR1 2603/4885DRD3 340/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | TP53 4418/4885S1PR1 3651/4885DRD3 711/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.