SCHEMBL1639899

SCHEMBL1639899

CCO[Si](OCC)(OCC)c1ccc(-c2ccccc2)c([Si](OCC)(OCC)OCC)c1[Si](OCC)(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SOAT1 P35610 1/20 0.33
NPC1 O15118 3/20 0.33
ALDH1A1 P00352 3/20 0.33
RAB9A P51151 3/20 0.33
MAPK1 P28482 1/20 0.33
LMNA P02545 2/20 0.32
GAA P10253 1/20 0.32
MAPK10 P53779 1/20 0.32
SMN1; SMN2 Q16637 3/20 0.31
KDM4E B2RXH2 2/20 0.31
TP53 P04637 2/20 0.31
HPGD P15428 2/20 0.31
ADRB2 P07550 1/20 0.30
USP2 O75604 1/20 0.30
MAPT P10636 1/20 0.30
TSHR P16473 1/20 0.30
NFKB1 P19838 1/20 0.30
NFKB2 Q00653 1/20 0.30
RELA Q04206 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL545764 0.87 CD274 (0.35) SOAT1NPC1ALDH1A1RAB9AMAPK1
SCHEMBL4279699 0.79 ADRB2 (0.37) SOAT1NPC1ALDH1A1RAB9AMAPK1
SCHEMBL1637771 0.77 SQOR (0.34) MAPTTSHR
SCHEMBL1639792 0.75 KDM4E (0.33) NPC1ALDH1A1RAB9ALMNAGAA
SCHEMBL4346884 0.74 NPC1 (0.32) NPC1ALDH1A1RAB9AMAPK1LMNA
SCHEMBL1639905 0.74 CYP1A2 (0.35)
Benzene SCHEMBL28867986 0.73 LTA4H (0.37) NPC1ALDH1A1RAB9AMAPK1SMN1; SMN2
SCHEMBL1639898 0.72 CYP1A2 (0.30)
SCHEMBL5487167 0.72 ALDH1A1 (0.35) SOAT1NPC1ALDH1A1RAB9AMAPK1
SCHEMBL29520127 0.71 ALDH1A1 (0.33) NPC1ALDH1A1RAB9AMAPK1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1391476-B1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2015-12-09 EP disclosed
US-8536242-B2 Photocurable composition SEKISUI CHEMICAL CO., LTD. (JP) 2013-09-17 US disclosed
US-20110097669-A1 PHOTOCURABLE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2011-04-28 US disclosed
US-7312013-B2 Photoreactive composition SEKISUI CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed