SCHEMBL545764

SCHEMBL545764

CCO[Si](OCC)(OCC)c1cccc(-c2ccccc2)c1[Si](OCC)(OCC)OCC

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CD274 Q9NZQ7 4/20 0.35
PDCD1 Q15116 1/20 0.35
ADRB2 P07550 1/20 0.33
SOAT1 P35610 1/20 0.33
ALDH1A1 P00352 5/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
MAPK1 P28482 1/20 0.33
ADRA2A P08913 1/20 0.32
ADRA2B P18089 1/20 0.32
ADRA2C P18825 1/20 0.32
LMNA P02545 1/20 0.32
HTR7 P34969 1/20 0.32
DPP4 P27487 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
ADORA3 P0DMS8 1/20 0.31
ADORA2A P29274 1/20 0.31
ADORA1 P30542 1/20 0.31
CRHR1 P34998 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1639899 0.87 SOAT1 (0.33) ADRB2SOAT1ALDH1A1NPC1RAB9A
SCHEMBL1639898 0.86 CYP1A2 (0.30)
SCHEMBL4279699 0.86 ADRB2 (0.37) CD274PDCD1ADRB2SOAT1ALDH1A1
SCHEMBL1639905 0.82 CYP1A2 (0.35)
SCHEMBL1639728 0.79 PDCD1 (0.34) CD274PDCD1ADRB2ALDH1A1NPC1
SCHEMBL1109615 0.78 PKM (0.34) ALDH1A1KDM4E
Benzene SCHEMBL28867986 0.78 LTA4H (0.37) ALDH1A1NPC1RAB9AMAPK1L3MBTL1
SCHEMBL1109640 0.77 PDCD1 (0.34) CD274PDCD1ADRB2ALDH1A1NPC1
SCHEMBL29520127 0.75 ALDH1A1 (0.33) ALDH1A1NPC1RAB9AMAPK1TP53
SCHEMBL331176 0.75 ALDH1A1 (0.33) ALDH1A1NPC1RAB9AMAPK1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9657174-B2 Siloxane monomer, encapsulant composition, encapsulant and electronic device CHEIL INDUSTRIES, INC. (KR) 2017-05-23 US claimed
US-9291899-B2 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2016-03-22 US claimed
US-20150322096-A1 SILOXANE MONOMER, ENCAPSULANT COMPOSITION, ENCAPSULANT AND ELECTRONIC DEVICE CHEIL INDUSTRIES INC. (KR) 2015-11-12 US claimed
US-8455605-B2 Resin composition for transparent encapsulation material and electronic device formed using the same CHEIL INDUSTRIES, INC. (KR) 2013-06-04 US claimed
US-20120270998-A1 RESIN COMPOSITION FOR TRANSPARENT ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE FORMED USING THE SAME CHEIL INDUSTRIES, INC. (KR) 2012-10-25 US claimed
US-20100167203-A1 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2010-07-01 US claimed
CN-119524628-A MXene doped organosilicon pervaporation dehydration film and preparation method thereof 中国石油化工股份有限公司 2025-02-28 CN disclosed
CN-117224707-A Anti-nitrification nano-material, and preparation method and application thereof 复旦大学附属眼耳鼻喉科医院 2023-12-15 CN disclosed
CN-110108656-A A kind of method of the fixed uricase detection uric acid of mesoporous organosilicon hollow nanospheres 吉林大学 2019-08-09 CN disclosed
CN-105283512-B Composition for forming cured film, alignment material, and phase difference material 日产化学工业株式会社 2018-12-11 CN disclosed
CN-105658702-B High-fire resistance polysilsesquioxane class photosensitive polymer combination LTC有限公司 2018-08-07 CN disclosed
EP-3227390-A1 CARBOSILANE POLYMERS Honeywell International Inc. (US) 2017-10-11 EP disclosed
US-9657174-B2 Siloxane monomer, encapsulant composition, encapsulant and electronic device CHEIL INDUSTRIES, INC. (KR) 2017-05-23 US disclosed
US-20100191009-A1 ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES HAVING AN ORDERED STRUCTURE ENI S.P.A. (IT) 2010-07-29 US disclosed
EP-2204399-A2 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same Cheil Industries Inc. (KR) 2010-07-07 EP disclosed
US-20100167203-A1 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same CHEIL INDUSTRIES, INC. (KR) 2010-07-01 US disclosed
US-20100167212-A1 RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME CHEIL INDUSTRIES, INC. (KR) 2010-07-01 US disclosed
US-7312013-B2 Photoreactive composition SEKISUI CHEMICAL CO., LTD. (JP) 2007-12-25 US disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100191009-A1 ORGANIC-INORGANIC HYBRID SILICATES AND METAL-SILICATES HAVING AN ORDERED STRUCTURE DIS3, SSR4, CCT4 CD274 944/4885PDCD1 1424/4885ADRB2 1212/4885
US-20150322096-A1 SILOXANE MONOMER, ENCAPSULANT COMPOSITION, ENCAPSULANT AND ELECTRONIC DEVICE SEM1, ELP1, GPS1 CD274 3567/4885PDCD1 3983/4885ADRB2 2782/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.