SCHEMBL1643503

SCHEMBL1643503

Cc1cccc(-c2cccc3nn(O)nc23)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ENPP1 P22413 1/20 0.41
RAB9A P51151 4/20 0.39
NPC1 O15118 3/20 0.39
KDM4E B2RXH2 1/20 0.39
CHEK1 O14757 1/20 0.38
MAP4K4 O95819 1/20 0.38
ABL1 P00519 1/20 0.38
NTRK1 P04629 1/20 0.38
LCK P06239 1/20 0.38
FYN P06241 1/20 0.38
CSF1R P07333 1/20 0.38
MET P08581 1/20 0.38
PDGFRB P09619 1/20 0.38
PIM1 P11309 1/20 0.38
FGFR1 P11362 1/20 0.38
PDGFRA P16234 1/20 0.38
PRKACA P17612 1/20 0.38
LTK P29376 1/20 0.38
GRK5 P34947 1/20 0.38
KDR P35968 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8645604 0.84 COMT (0.39) ENPP1RAB9ANPC1KDM4EFLT3
SCHEMBL1263567 0.82 MET (0.38) ENPP1KDM4EMETKMT2AMAPT
SCHEMBL28608544 0.81 KIF11 (0.43) KDM4E
SCHEMBL2904205 0.79 RAB9A (0.48) RAB9ANPC1KDM4EKMT2ALMNA
SCHEMBL28511468 0.77 CNR1 (0.45) KDM4EMETALDH1A1
SCHEMBL9741815 0.76 KMT2A (0.38) ENPP1RAB9ANPC1KDM4EKMT2A
SCHEMBL8428274 0.76 PDE4D (0.35) MAP4K4ABL1NTRK1FYNCSF1R
SCHEMBL2730925 0.75 PTGS2 (0.39) KDM4EKMT2APOLBMAPTNPSR1
SCHEMBL15499013 0.72 TGFBR1 (0.46) ENPP1RAB9AKDM4ECHEK1MAP4K4
SCHEMBL11609550 0.72 LMNA (0.47) ENPP1RAB9ANPC1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5508339-A Acrylic/lactam resin compositions and method of producing same QUEST TECHNOLOGIES, INC. 1996-04-16 US claimed
JP-63086753-A None JP disclosed
CN-115003750-A Inverse latex for cosmetic compositions combining a specific sequestering agent and a polyelectrolyte with weak acid functions 化工产品开发公司SEPPIC 2022-09-02 CN disclosed
CN-112135847-B Self-invertible inverse latex comprising polyglycerol esters, use thereof as a thickener, and cosmetic composition comprising same 化工产品开发公司SEPPIC 2022-08-23 CN disclosed
CN-111447914-B New polyol rhamnoglycosides, process for their preparation and cosmetic and/or pharmaceutical compositions containing them 化工产品开发公司SEPPIC 2022-08-05 CN disclosed
CN-114845693-A Inverse latex for cosmetic compositions comprising a specific sequestering agent and a polyelectrolyte combining a strong acid function and a neutral function 化工产品开发公司SEPPIC 2022-08-02 CN disclosed
CN-114845781-A Inverse latex for cosmetic compositions comprising a specific sequestering agent and a polyelectrolyte combining a strong acid function and a weak acid function 化工产品开发公司SEPPIC 2022-08-02 CN disclosed
CN-114846079-A Inverse latex for cosmetic compositions combining EDDS as sequestering agent and polyelectrolyte comprising AMPS and acrylamide 化工产品开发公司SEPPIC 2022-08-02 CN disclosed
CN-109789086-B Method for obtaining a dianthus extract rich in diglycosides and its use in cosmetics 海洋生物技术公司 2022-06-28 CN disclosed
CN-114650803-A Cosmetic composition in the form of a compact, impact-resistant powder 化工产品开发公司SEPPIC 2022-06-21 CN disclosed
US-20110096966-A1 METHOD AND APPARATUS FOR DETECTING BONE VARIABILITY WITH ULTRAVIOLET LIGHT WEINBERG MEDICAL PHYSICS LLC 2011-04-28 US disclosed
EP-0632029-A1 Benzylidene hydantoin derivative, ultraviolet ray absorbent and external preparation for skin including the same SHISEIDO COMPANY LIMITED (JP) 1995-01-04 EP disclosed
JP-S6386753-A ANTISTATIC RESIN COMPOSITION SEKISUI CHEM CO LTD 1988-04-18 JP disclosed
EP-0015230-B1 STABILIZED ORGANIC POLYMER COMPRISING 2-(2-HYDROXY-3,5-DI-TERT-OCTYLPHENYL)-2H-BENZOTRIAZOLE AS A LIGHT-STABILIZER CIBA-GEIGY AG (CH) 1983-02-23 EP disclosed
US-4349602-A Substrates coated with a thermoset acrylic primer and an alkoxysilylbenzotriazole UV stabilizer GENERAL ELECTRIC COMPANY (US) 1982-09-14 US disclosed
EP-0016870-B1 PROCESS FOR POLYMERISING METHYLMETHACRYLATE, LAMINA PRODUCED FROM THIS POLYMER AND ITS USE RÖHM GMBH (DE) 1982-04-21 EP disclosed
US-4316033-A Alkoxysilylbenzotriazoles GENERAL ELECTRIC COMPANY (US) 1982-02-16 US disclosed
EP-0016870-A1 Process for polymerising methylmethacrylate, lamina produced from this polymer and its use RÖHM GMBH (DE) 1980-10-15 EP disclosed
EP-0015230-A1 Stabilized organic Polymer comprising 2-(2-hydroxy-3,5-di-tert-octylphenyl)-2H-benzotriazole as a light-stabilizer CIBA-GEIGY AG (CH) 1980-09-03 EP disclosed
US-4131463-A Electric recording process of images using electron sensitive layer containing trivalent cobalt complex and compound having conjugated π bond system FUJI PHOTO FILM CO., LTD. (JP) 1978-12-26 US disclosed