SCHEMBL1669167

SCHEMBL1669167

CC(=O)c1cccc(C)c1C(C)=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.48
BRPF1 P55201 1/20 0.47
ALDH1A1 P00352 5/20 0.47
HPGD P15428 3/20 0.47
KDM4E B2RXH2 3/20 0.47
HSD17B10 Q99714 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.43
MYC P01106 1/20 0.42
KMT2A Q03164 3/20 0.40
TDP1 Q9NUW8 2/20 0.40
CYP3A4 P08684 2/20 0.40
CYP2C9 P11712 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
POLB P06746 1/20 0.39
KCNK3 O14649 1/20 0.39
KCNK9 Q9NPC2 1/20 0.39
PKM P14618 1/20 0.38
MEN1 O00255 1/20 0.38
AKR1B10 O60218 1/20 0.38
TRPA1 O75762 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6640523 0.87 ALDH1A1 (0.53) BRPF1ALDH1A1HPGDKDM4EHSD17B10
SCHEMBL7280223 0.87 ALDH1A1 (0.59) THRBALDH1A1HPGDKDM4EHSD17B10
SCHEMBL696352 0.85 THRB (0.56) THRBBRPF1ALDH1A1HPGDKDM4E
SCHEMBL600052 0.85 THRB (0.56) THRBBRPF1ALDH1A1HPGDKDM4E
SCHEMBL21792636 0.85 BRPF1 (0.43) THRBBRPF1ALDH1A1HPGDKDM4E
Ammonia Solution, Strong SCHEMBL28175403 0.83 THRB (0.54) THRBBRPF1ALDH1A1HPGDKDM4E
SCHEMBL1667181 0.81 THRB (0.52) THRBBRPF1ALDH1A1HPGDKDM4E
SCHEMBL3207316 0.81 MYC (0.53) ALDH1A1HPGDKDM4EHSD17B10MYC
SCHEMBL4067363 0.80 HPGD (0.50) BRPF1ALDH1A1HPGDKDM4EHSD17B10
SCHEMBL697259 0.79 ESR1 (0.50) BRPF1ALDH1A1HPGDKDM4EHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP claimed
CN-108101763-A Double [4 '-(the 2,2- dialkoxies acetyl) phenyl] methane of photoinitiator and its synthetic method 怀化金鑫新材料有限公司 2018-06-01 CN claimed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP claimed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP claimed
US-20230142883-A1 COMPOUNDS AND USES THEREOF FOGHORN THERAPEUTICS INC. 2023-05-11 US disclosed
US-20220117937-A1 USE OF SMALL MOLECULE INHIBITORS OF THE BFRB:BFD INTERACTION IN BIOFILMS BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) 2022-04-21 US disclosed
EP-2808736-B1 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2018-07-18 EP disclosed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP disclosed
US-8802353-B2 Compound for resist and radiation-sensitive composition specification MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-08-12 US disclosed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP disclosed
US-8350096-B2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-08 US disclosed
US-20130004896-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION ECHIGO MASATOSHI (JP) 2013-01-03 US disclosed
CN-101578320-A Novel polyimide precursor composition, use thereof and process for producing the same KANEKA CORP (JP) 2009-11-11 CN disclosed
US-20080113294-A1 Compound for Resist and Radiation-Sensitive Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-05-15 US disclosed
CN-101088046-A Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-12-12 CN disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 EP disclosed
CN-1113904-C Olefin polymerization process MITSUI CHEMICALS INC (JP) 2003-07-09 CN disclosed
CN-1225369-A Olefin polymerization process MITSUI CHEMICALS INC (JP) 1999-08-11 CN disclosed
CN-1043233-C Olefin polymerization catalyst and use thereof MITSUI CHEMICAL CO LTD (JP) 1999-05-05 CN disclosed
CN-1040379-A Process for polymerization of olefins and catalyst for polymerization MITSUI PETROCHEMICAL IND (JP) 1990-03-14 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220117937-A1 USE OF SMALL MOLECULE INHIBITORS OF THE BFRB:BFD INTERACTION IN BIOFILMS BLVRB, Q6ZSR9, BTD THRB 2617/4885BRPF1 273/4885ALDH1A1 2628/4885
US-20230142883-A1 COMPOUNDS AND USES THEREOF VHL, TFEB, BECN1 THRB 4149/4885BRPF1 670/4885ALDH1A1 1358/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.