SCHEMBL16741963

SCHEMBL16741963

CCCCc1cccc2c(OCC)c3ccccc3c(OCC)c12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MPO P05164 1/20 0.36
SLC2A1 P11166 2/20 0.36
LIPG Q9Y5X9 1/20 0.36
ALOX5 P09917 1/20 0.36
PTGS2 P35354 1/20 0.36
ELANE P08246 1/20 0.35
CSNK1A1 P48729 1/20 0.35
CSNK1D P48730 1/20 0.35
PRKCD Q05655 1/20 0.35
PAK1 Q13153 1/20 0.35
CAMK2B Q13554 1/20 0.35
CAMK2G Q13555 1/20 0.35
CAMK2D Q13557 1/20 0.35
TAOK1 Q7L7X3 1/20 0.35
ADORA3 P0DMS8 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2401301 0.91 CSNK1A1 (0.40) SLC2A1LIPGALOX5PTGS2CSNK1A1
SCHEMBL30849716 0.91 CSNK1A1 (0.40) SLC2A1LIPGALOX5PTGS2CSNK1A1
SCHEMBL27664398 0.89 CSNK1A1 (0.37) SLC2A1LIPGALOX5PTGS2CSNK1A1
SCHEMBL27664396 0.83 KDM4E (0.48) LIPGALOX5PTGS2CSNK1A1CSNK1D
SCHEMBL27974811 0.81 THRA (0.34) SLC2A1LIPGALOX5PTGS2CSNK1A1
SCHEMBL30529719 0.79 SLC2A1 (0.40) SLC2A1CYP2C9MAPT
SCHEMBL27975002 0.79 DHFR (0.37) PTGS2
SCHEMBL27993554 0.78 PTGS2 (0.49) LIPGALOX5PTGS2MAPTKDM4E
SCHEMBL31080976 0.77 FAAH (0.41) SLC2A1CYP3A4CYP2C9TP53MAPT
SCHEMBL28075742 0.76 LTA4H (0.47) MPOSLC2A1CYP2C9TP53MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109799680-A Chemical amplification positive photosensitive resin composition and its application 奇美实业股份有限公司 2019-05-24 CN disclosed
EP-3077871-A1 PREPARATION OF ARTICLES WITH CONDUCTIVE MICRO-WIRE PATTERN Eastman Kodak Company (US) 2016-10-12 EP disclosed
CN-103717553-B Gas generating material and micropump SEKISUI CHEMICAL CO.,LTD. (JP) 2015-08-19 CN disclosed
WO-2015077030-A1 CROSSLINKABLE REACTIVE POLYMERS EASTMAN KODAK COMAPNY (US) 2015-05-28 WO disclosed
CN-102822306-B Adhesive composition, adhesive tape, method for processing semiconductor wafer, and method for manufacturing TSV wafer SEKISUI CHEMICAL CO LTD 2015-02-11 CN disclosed
CN-104350030-A Gas-generating material and micropump SEKISUI CHEMICAL CO LTD 2015-02-11 CN disclosed
CN-103717553-A Gas generating material, and micropump SEKISUI CHEMICAL CO LTD 2014-04-09 CN disclosed
CN-1989145-B Novel fluoroalkyl fluorophosphoric acid onium salts and transition metal complex salts SAN APRO LTD 2010-06-23 CN disclosed
CN-1989145-A Novel fluorinated alkyl fluorophosphoric acid onium salts and transition metal complex salts SAN APRO LTD (JP) 2007-06-27 CN disclosed