SCHEMBL17185506

SCHEMBL17185506

O=C1c2cccc3c(C#Cc4ccccc4)ccc(c23)C(=O)N1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 6/20 0.54
▸ POLB P06746 6/20 0.54
▸ TDP1 Q9NUW8 3/20 0.54
▸ ERCC1 P07992 2/20 0.54
▸ FEN1 P39748 2/20 0.54
▸ ERCC4 Q92889 2/20 0.54
▸ CYP1A2 P05177 1/20 0.54
▸ TSHR P16473 1/20 0.54
▸ ALOX12 P18054 1/20 0.54
▸ KMT2A Q03164 8/20 0.50
▸ KDM4E B2RXH2 7/20 0.50
▸ ALDH1A1 P00352 7/20 0.50
▸ HTT P42858 4/20 0.50
▸ LMNA P02545 3/20 0.50
▸ XBP1 P17861 2/20 0.50
▸ PABPC1 P11940 1/20 0.50
▸ NFKB1 P19838 1/20 0.50
▸ SMARCA2 P51531 1/20 0.50
▸ NFKB2 Q00653 1/20 0.50
▸ RELA Q04206 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15843910 0.81 TYMS (0.50) MAPTPOLBTDP1CYP1A2KMT2A
SCHEMBL26556567 0.80 MEN1 (0.53) MAPTPOLBTDP1KMT2AKDM4E
SCHEMBL28460070 0.79 GRM5 (0.54) MAPTPOLBTDP1CYP1A2KMT2A
SCHEMBL18069192 0.78 KMT2A (0.46) MAPTPOLBTDP1CYP1A2KMT2A
SCHEMBL25420764 0.77 TERT (0.55) MAPTPOLBKMT2AKDM4EALDH1A1
SCHEMBL30436778 0.77 TERT (0.55) MAPTPOLBKMT2AKDM4EALDH1A1
SCHEMBL17185507 0.76 KMT2A (0.45) MAPTPOLBTDP1KMT2AKDM4E
SCHEMBL12296929 0.76 KMT2A (0.49) MAPTPOLBTDP1ERCC1FEN1
SCHEMBL18069180 0.75 KMT2A (0.48) MAPTPOLBTDP1ERCC1FEN1
SCHEMBL18069188 0.73 KMT2A (0.49) MAPTPOLBTDP1ERCC1FEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10976658-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications HERAEUS EPURIO LLC (US) 2021-04-13 — — US disclosed
US-9709886-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2017-07-18 — — US disclosed
US-9709886-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2017-07-18 — — US disclosed
WO-2017034814-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS Heraeus Precious Metals North America Daychem LLC (US) 2017-03-02 — — WO disclosed
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2017-01-05 — — US disclosed
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2017-01-05 — — US disclosed
US-9505721-B2 Aromatic imide compound and method for producing same AZ ELECRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-11-29 — — US disclosed
US-9505721-B2 Aromatic imide compound and method for producing same AZ ELECRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-11-29 — — US disclosed
US-9505721-B2 Aromatic imide compound and method for producing same AZ ELECRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-11-29 — — US disclosed
US-9477150-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-10-25 — — US disclosed
US-9477150-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-10-25 — — US disclosed
WO-2016148809-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS Heraeus Precious Metals North America Daychem LLC (US) 2016-09-22 — — WO disclosed
US-20160266487-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-09-15 — — US disclosed
US-20160266487-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-09-15 — — US disclosed
US-20150299132-A1 AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2015-10-22 — — US disclosed
US-20150299132-A1 AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2015-10-22 — — US disclosed
US-20150299132-A1 AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2015-10-22 — — US disclosed
CN-104797560-A Aromatic imide compound and method for producing same AZ ELECTRONIC MATERIALS LUXEMBOURG SARL 2015-07-22 — — CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160266487-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS ALAD, MPST, ASIC1 MAPT 3437/4885POLB 840/4885TDP1 4387/4885
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS ALAD, MPST, ASIC1 MAPT 3437/4885POLB 840/4885TDP1 4387/4885
US-10976658-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications ALAD, MPST, ASIC1 MAPT 4221/4885POLB 280/4885TDP1 3152/4885
US-20150299132-A1 AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME H1-0, H4C1; H4C2; H4C3; H4C4; H4C5; H4C6; H4C8; H4C9; H4C11; H4C12; H4C13; H4C14; H4C15; H4C16, HRH4 MAPT 4416/4885POLB 4137/4885TDP1 3922/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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