SCHEMBL17341926

SCHEMBL17341926

CN(C(=O)O/N=C(\C(=O)C(C)(C)C)c1nc2ccccc2o1)c1ccncc1

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ XDH P47989 8/20 0.42
▸ TLR4 O00206 1/20 0.39
▸ NLRP3 Q96P20 1/20 0.39
▸ BRD4 O60885 1/20 0.38
▸ RAB9A P51151 2/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ TNF P01375 1/20 0.37
▸ KDM4E B2RXH2 1/20 0.36
▸ FAAH O00519 1/20 0.36
▸ HSF1 Q00613 1/20 0.36
▸ KMT2A Q03164 2/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ PAX8 Q06710 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341928 0.83 XDH (0.49) XDHTLR4NLRP3RAB9ANPC1
SCHEMBL17341908 0.78 NPC1 (0.48) XDHTLR4NLRP3RAB9ANPC1
SCHEMBL17341915 0.78 PAX8 (0.46) RAB9ANPC1KDM4EKMT2ASMN1; SMN2
SCHEMBL17341906 0.73 XDH (0.43) XDHTLR4NLRP3RAB9ANPC1
SCHEMBL16381780 0.69 XDH (0.50) XDHTLR4NLRP3RAB9ANPC1
SCHEMBL17341904 0.68 XDH (0.40) XDHFAAHHSF1
SCHEMBL17736497 0.67 XDH (0.37) XDHTLR4NLRP3RAB9ANPC1
SCHEMBL17736500 0.67 XDH (0.39) XDHTLR4NLRP3RAB9ANPC1
SCHEMBL11930608 0.66 RAB9A (0.52) XDHRAB9ANPC1TNFKDM4E
SCHEMBL17736498 0.65 FAAH (0.39) XDHTLR4NLRP3RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI XDH 3449/4885TLR4 3990/4885NLRP3 1265/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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