Phenol

Phenol

SCHEMBL1736173

Oc1ccccc1.[Na+].[OH-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Phenol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenol SCHEMBL8857356 1.00 CA12 (0.85)
Phenol SCHEMBL10627588 1.00 CA12 (0.85)
Phenol SCHEMBL18148269 0.96 CA12 (0.79)
Phenol SCHEMBL32679316 0.92 CA12 (0.85)
Phenol SCHEMBL5014081 0.92
Phenol SCHEMBL29196125 0.92 CA12 (0.85)
Phenol SCHEMBL11294759 0.92 CA12 (0.85)
Phenol SCHEMBL3723819 0.92
Phenol SCHEMBL21630419 0.92
Phenol SCHEMBL8986244 0.92 CA12 (0.85)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114733552-A Preparation method and application of integral light dual-magnetic photocatalytic composite material 西南林业大学 2022-07-12 CN claimed
CN-107649067-A A kind of abietyl rigid anionic surfactant and its stable foam of formation 中国林业科学研究院林产化学工业研究所 2018-02-02 CN claimed
CN-104151152-B A kind of three circulating methods preparing phenoxy acetic acid without waste water NORTHEASTERN UNIVERSITY (CN) 2015-11-04 CN claimed
CN-104151152-A Ternary-cycle type no-waste-free preparing method for phenoxyacetic acid UNIV NORTHEASTERN 2014-11-19 CN claimed
CN-117659114-A PH-responsive rosin-based Schiff base AIE surfactant, preparation method and application thereof 中国林业科学研究院林产化学工业研究所 2024-03-08 CN disclosed
CN-111606967-B Maleopimaric acid radical azobenzene monomer and preparation method thereof 中国林业科学研究院林产化学工业研究所 2023-03-14 CN disclosed
CN-114133596-A Preparation and application of ABA type photosensitive gel 山东理工大学 2022-03-04 CN disclosed
EP-3891117-A1 METHOD FOR PRODUCING A HYDROXY COMPOUND BY DECARBOXYLATION IN THE PRESENCE OF A BRONSTED BASE Covestro Intellectual Property GmbH & Co. KG (DE) 2021-10-13 EP disclosed
EP-3891116-A1 PROCESS FOR PREPARING A HYDROXY COMPOUND BY MEANS OF DECARBOXYLATION Covestro Intellectual Property GmbH & Co. KG (DE) 2021-10-13 EP disclosed
CN-112812003-A Preparation method of 4-hydroxymandelic acid 湖南复瑞生物医药技术有限责任公司 2021-05-18 CN disclosed
CN-111606967-A Maleopimaric acid radical azobenzene monomer and preparation method thereof 中国林业科学研究院林产化学工业研究所 2020-09-01 CN disclosed
WO-2020114928-A1 PROCESS FOR PREPARING A HYDROXY COMPOUND BY MEANS OF DECARBOXYLATION COVESTRO DEUTSCHLAND AG (DE) 2020-06-11 WO disclosed
WO-2001062442-A1 NONWOVEN ABRASIVE ARTICLES AND METHODS 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-08-30 WO disclosed
CN-1223995-A Method for manufacturing bisphenol GEN ELECTRIC (US) 1999-07-28 CN disclosed
EP-0918046-A1 Method for manufacturing bisphenol GENERAL ELECTRIC COMPANY (US) 1999-05-26 EP disclosed
US-4977231-A Controlled latent curing; high strength, chemical resistant adhesives for wood products GEORGIA-PACIFIC CORPORATION (US) 1990-12-11 US disclosed
EP-0259655-A1 Preparations of foundry moulds and cores BRITISH INDUSTRIAL SAND LIMITED (GB) 1988-03-16 EP disclosed
EP-0162562-A1 Preparation of foundry moulds and cores BRITISH INDUSTRIAL SAND LIMITED (GB) 1985-11-27 EP disclosed
US-4373062-A Phenol-resorcinol-formaldehyde resin BROWN GORDON E 1983-02-08 US disclosed
US-4298765-A BASIFICATION, AZEOTROPIC STEAM DISTILLATION, SOLVENT EXTRACTION ALLIED CORPORATION (US) 1981-11-03 US disclosed