Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.35 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.32 |
| ▸ | HTR1A | P08908 | 1/20 | 0.32 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.32 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.32 |
| ▸ | DRD2 | P14416 | 1/20 | 0.32 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.32 |
| ▸ | DRD4 | P21917 | 1/20 | 0.32 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.32 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.32 |
| ▸ | HRH1 | P35367 | 1/20 | 0.32 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.32 |
| ▸ | LDLR | P01130 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24490435 | 0.85 | L3MBTL1 (0.33) | MEN1KMT2AL3MBTL1TDP1 | |
| SCHEMBL18122994 | 0.85 | FFAR1 (0.33) | FFAR1TDP1 | |
| SCHEMBL23552647 | 0.84 | CNR2 (0.38) | L3MBTL1CYP2C9 | |
| SCHEMBL29316858 | 0.84 | MEN1 (0.40) | MEN1KMT2AL3MBTL1TDP1LDLR | |
| SCHEMBL17877627 | 0.82 | ALDH1A1 (0.36) | MEN1KMT2AL3MBTL1SMN1; SMN2ALDH1A1 | |
| SCHEMBL17056227 | 0.82 | ALDH1A1 (0.36) | MEN1KMT2AL3MBTL1SMN1; SMN2ALDH1A1 | |
| SCHEMBL17084350 | 0.82 | ALDH1A1 (0.36) | MEN1KMT2AL3MBTL1SMN1; SMN2ALDH1A1 | |
| SCHEMBL29789550 | 0.82 | ALDH1A1 (0.36) | MEN1KMT2AL3MBTL1SMN1; SMN2ALDH1A1 | |
| SCHEMBL25911822 | 0.81 | MAPT (0.47) | MEN1KMT2AL3MBTL1TDP1SMN1; SMN2 | |
| SCHEMBL21253182 | 0.80 | KMT2A (0.38) | MEN1KMT2AL3MBTL1FFAR1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240239922-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240239922-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20230242692-A1 | COMPOSITION AND CURED PRODUCT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230242692-A1 | COMPOSITION AND CURED PRODUCT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| WO-2023127402-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING PATTERNED CURED FILM | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023127401-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING PATTERNED CURED FILM | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023120076-A1 | PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-06-29 | — | — | WO | disclosed |
| WO-2023074266-A1 | PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-05-04 | — | — | WO | disclosed |
| WO-2023058418-A1 | COMPOSITION, AND PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-04-13 | — | — | WO | disclosed |
| US-20230056225-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-23 | — | — | US | disclosed |
| US-20180113383-A1 | COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-04-26 | — | — | US | disclosed |
| US-20180107114-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2018-04-19 | — | — | US | disclosed |
| US-20180107114-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2018-04-19 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| EP-3275940-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2018-01-31 | — | — | EP | disclosed |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-08 | — | — | US | disclosed |
| WO-2017007010-A1 | SILICON-CONTAINING RESIN COMPOSITION | 東京応化工業株式会社 | 2017-01-12 | — | — | WO | disclosed |
| WO-2016158679-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | 東京応化工業株式会社 | 2016-10-06 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180107114-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM | RARA, LCP1, CUTA | MEN1 3700/4885KMT2A 148/4885L3MBTL1 4071/4885 |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | SLC9A2, SLC9A1, NHERF1 | MEN1 626/4885KMT2A 1420/4885L3MBTL1 4707/4885 |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | C1R, CRY1, C1S | MEN1 167/4885KMT2A 371/4885L3MBTL1 3341/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.