SCHEMBL1828702

SCHEMBL1828702

O=C(O)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.44
LMNA P02545 3/20 0.35
ALKBH5 Q6P6C2 1/20 0.35
SUCNR1 Q9BXA5 1/20 0.35
EGLN1 Q9GZT9 1/20 0.35
GBA1 P04062 4/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 1/20 0.33
CYP1A2 P05177 1/20 0.33
KMT2A Q03164 1/20 0.33
NAALAD2 Q9Y3Q0 1/20 0.32
SLC22A6 Q4U2R8 1/20 0.32
CA2 P00918 2/20 0.31
TSHR P16473 1/20 0.31
NFKB1 P19838 1/20 0.31
PMP22 Q01453 1/20 0.31
CA1 P00915 1/20 0.30
MMP1 P03956 1/20 0.30
MMP2 P08253 1/20 0.30
MMP9 P14780 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5483523 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5490493 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL1519575 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL1827086 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5485779 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5488963 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL934065 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5490761 1.00 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL935232 0.98 THRB (0.41) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL9438155 0.93 LMNA (0.40) THRBLMNAALKBH5SUCNR1EGLN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4676604-A1 METHOD FOR REMOVING PFAS COMPRISED IN WASTE SARP INDUSTRIES (FR) 2026-01-14 EP claimed
EP-4527829-A1 PROCESS FOR THE PURIFICATION OF PERFLUOROALKYL ACIDS Chiron AS (NO) 2025-03-26 EP claimed
US-20250034002-A1 MATERIALS FOR THE CAPTURE OF SUBSTANCES Membrion, Inc. (US) 2025-01-30 US claimed
EP-4444464-A1 MATERIALS FOR THE CAPTURE OF SUBSTANCES Membrion, Inc. (US) 2024-10-16 EP claimed
WO-2024189286-A1 METHOD FOR REMOVING PFAS COMPRISED IN WASTE SARP INDUSTRIES (FR) 2024-09-19 WO claimed
WO-2023107629-A1 MATERIALS FOR THE CAPTURE OF SUBSTANCES Membrion, Inc. (US) 2023-06-15 WO claimed
WO-2026102095-A1 METHODS FOR DETECTING PER- OR POLY-FLUOROALKYL SUBSTANCES WITH FLUOROPHORES UNIVERSITY OF UTAH RESEARCH FOUNDATION (US) 2026-05-15 WO disclosed
US-12576297-B2 Apparatus and methods for sonochemical degradation of per- and polyfluoroalkyl substances THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2026-03-17 US disclosed
US-20260035630-A1 SYSTEM AND METHOD FOR PRODUCING CLEAN SYNGAS FROM BIOSOLID MATERIALS HAVING FLUOROCARBON MATERIALS THEREIN COGENT ENERGY SYSTEMS INC (US) 2026-02-05 US disclosed
US-20260023052-A1 METHOD FOR MEASURING CONCENTRATION OF PER- AND POLYFLUOROALKYL SUBSTANCE AND LIQUID CHROMATOGRAPHY-TANDEM MASS SPECTROMETRY SYSTEM RESEARCH CENTER FOR ECO-ENVIRONMENTAL SCIENCES, CHINESE ACADEMY OF SCIENCES (CN) 2026-01-22 US disclosed
EP-4680416-A1 CONTAMINANT IMMOBILISATION IN ASPHALT Rembind Pty Ltd (AU) 2026-01-21 EP disclosed
US-20260001062-A1 MATERIALS AND SYSTEMS FOR DEGRADING CHEMICAL CONTAMINANTS IN WATER WILLIAM MARSH RICE UNIVERSITY (US) 2026-01-01 US disclosed
US-20250334546-A1 METHOD FOR RAPID DETECTION OF PFAS NEW JERSEY INSTITUTE OF TECHNOLOGY (US) 2025-10-30 US disclosed
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
US-20070196763-A1 Method of forming laminated resist DAIKIN INDUSTRIES, LTD. 2007-08-23 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed
EP-1686425-A1 METHOD FOR FORMING MULTILAYER RESIST Daikin Industries, Ltd. (JP) 2006-08-02 EP disclosed
EP-0837085-A1 POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-04-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260023052-A1 METHOD FOR MEASURING CONCENTRATION OF PER- AND POLYFLUOROALKYL SUBSTANCE AND LIQUID CHROMATOGRAPHY-TANDEM MASS SPECTROMETRY SYSTEM PFAS, SRMS, PHOSPHO1 THRB 3029/4885LMNA 2238/4885ALKBH5 508/4885
US-20260035630-A1 SYSTEM AND METHOD FOR PRODUCING CLEAN SYNGAS FROM BIOSOLID MATERIALS HAVING FLUOROCARBON MATERIALS THEREIN PFAS, FGB, GSS THRB 1929/4885LMNA 1609/4885ALKBH5 926/4885
US-12576297-B2 Apparatus and methods for sonochemical degradation of per- and polyfluoroalkyl substances PFAS, PIEZO1, UFL1 THRB 1680/4885LMNA 1329/4885ALKBH5 2079/4885
US-20260001062-A1 MATERIALS AND SYSTEMS FOR DEGRADING CHEMICAL CONTAMINANTS IN WATER UBE3C, EXOC1, ERCC1 THRB 2903/4885LMNA 657/4885ALKBH5 1420/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.