SCHEMBL935232

SCHEMBL935232

O=C(O)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.41
LMNA P02545 3/20 0.36
ALKBH5 Q6P6C2 1/20 0.36
SUCNR1 Q9BXA5 1/20 0.36
EGLN1 Q9GZT9 1/20 0.36
ALDH1A1 P00352 2/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
KMT2A Q03164 1/20 0.34
SLC22A6 Q4U2R8 1/20 0.33
NAALAD2 Q9Y3Q0 1/20 0.33
GBA1 P04062 4/20 0.32
TSHR P16473 2/20 0.32
NFKB1 P19838 1/20 0.32
PMP22 Q01453 1/20 0.32
FFAR3 O14843 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1519575 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5490761 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5483523 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL1827086 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5485779 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5488963 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL5490493 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL934065 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL1828702 0.98 THRB (0.44) THRBLMNAALKBH5SUCNR1EGLN1
SCHEMBL866227 0.93 LMNA (0.38) THRBLMNAALKBH5SUCNR1EGLN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240352163-A1 Preparation Method for Polytrifluorostyrene CHANGSHU 3F ZHONGHAO NEW CHEMICAL MATERIALS CO., LTD. (CN) 2024-10-24 US claimed
US-12576297-B2 Apparatus and methods for sonochemical degradation of per- and polyfluoroalkyl substances THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2026-03-17 US disclosed
US-20250110101-A1 PER AND POLYFLUOROALKYL SUBSTANCE MEASUREMENT DEXSIL CORPORATION (US) 2025-04-03 US disclosed
US-20240352163-A1 Preparation Method for Polytrifluorostyrene CHANGSHU 3F ZHONGHAO NEW CHEMICAL MATERIALS CO., LTD. (CN) 2024-10-24 US disclosed
US-12109812-B2 Ink jet printing method and ink jet printing apparatus SEIKO EPSON CORPORATION (JP) 2024-10-08 US disclosed
CN-111032669-B Orthoester compositions for affinity purification of oligonucleotides 安捷伦科技有限公司 2024-03-29 CN disclosed
EP-4098798-B1 PROCESS FOR PREPARING A POLYMER-COATED TEXTILE HAVING OMNIPHOBIC PROPERTIES UNIV COTE D'AZUR (FR) 2024-03-27 EP disclosed
US-20240059860-A1 METHODS AND SYSTEMS FOR DESTRUCTION OF SYNTHETIC PER- AND POLYFLUORO COMPOUNDS CHZ TECHNOLOGIES, LLC 2024-02-22 US disclosed
US-20230322742-A1 ORTHOESTER COMPOSITIONS FOR AFFINITY PURIFICATION OF OLIGONUCLEOTIDES AGILENT TECHNOLOGIES, INC. 2023-10-12 US disclosed
US-20230122968-A1 ORTHOESTER COMPOSITIONS FOR AFFINITY PURIFICATION OF OLIGONUCLEOTIDES AGILENT TECHNOLOGIES, INC. 2023-04-20 US disclosed
EP-2066651-A1 6-(BIPHENYL-ESTER)-3H-NAPHTHO[2, 1-B]PYRANS AS PHOTOCHROMIC DICHROIC DYES AND OPTICAL ARTICLE CONTAINING THEM Essilor International (Compagnie Générale D'Optique) (FR) 2009-06-10 EP disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
WO-2008028930-A1 6-(BIPHENYL-ESTER)-3H-NAPHTHO[2, 1-B]PYRANS AS PHOTOCHROMIC DICHROIC DYES AND OPTICAL ARTICLE CONTAINING THEM ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2008-03-13 WO disclosed
US-20070196763-A1 Method of forming laminated resist DAIKIN INDUSTRIES, LTD. 2007-08-23 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed
CN-1882882-A Method for forming multilayer resist DAIKIN IND LTD (JP) 2006-12-20 CN disclosed
EP-1686425-A1 METHOD FOR FORMING MULTILAYER RESIST Daikin Industries, Ltd. (JP) 2006-08-02 EP disclosed
US-6552069-B1 Having anti-estrogenic activity; for use in therapy CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2003-04-22 US disclosed
EP-1241166-A1 3-METHYL-CHROMAN AND -THIOCHROMAN DERIVATIVES CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2002-09-18 EP disclosed
EP-0837085-A1 POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-04-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230122968-A1 ORTHOESTER COMPOSITIONS FOR AFFINITY PURIFICATION OF OLIGONUCLEOTIDES RNGTT, DCLRE1B, MRTO4 THRB 795/4885LMNA 3109/4885ALKBH5 656/4885
US-12576297-B2 Apparatus and methods for sonochemical degradation of per- and polyfluoroalkyl substances PFAS, PIEZO1, UFL1 THRB 1680/4885LMNA 1329/4885ALKBH5 2079/4885
US-20230322742-A1 ORTHOESTER COMPOSITIONS FOR AFFINITY PURIFICATION OF OLIGONUCLEOTIDES RNGTT, OSBPL8, DCLRE1B THRB 688/4885LMNA 3111/4885ALKBH5 761/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.