Water

Water

SCHEMBL1839784

CC(C)(/N=N/C(C)(C)C(=O)NCCC(=O)O)C(=O)NCCC(=O)O.O

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA1A known ✓ P35348 1/20 0.34
ITGB3 known ✓ P05106 1/20 0.33
HDAC3 known ✓ O15379 1/20 0.31
HDAC1 known ✓ Q13547 1/20 0.31
HDAC2 known ✓ Q92769 1/20 0.31
HDAC8 known ✓ Q9BY41 1/20 0.31
ECE1 P42892 4/20 0.41
PLA2G2A P14555 1/20 0.37
FAAH O00519 2/20 0.35
CNR1 P21554 2/20 0.35
CNR2 P34972 2/20 0.35
NPSR1 Q6W5P4 1/20 0.35
ITGAV P06756 1/20 0.33
KMT2A Q03164 1/20 0.33
NAALAD2 Q9Y3Q0 1/20 0.33
KDM4E B2RXH2 1/20 0.33
HTT P42858 1/20 0.33
PRMT1 Q99873 1/20 0.32
POLB P06746 1/20 0.32
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL3737520 1.00 ECE1 (0.41) ECE1PLA2G2AFAAHCNR1CNR2
Water SCHEMBL1839787 1.00 ECE1 (0.41) ECE1PLA2G2AFAAHCNR1CNR2
Water SCHEMBL19970536 1.00 ECE1 (0.41) ECE1PLA2G2AFAAHCNR1CNR2
SCHEMBL830627 0.98 ECE1 (0.42) ECE1PLA2G2AFAAHCNR1CNR2
SCHEMBL177727 0.98 ECE1 (0.42) ECE1PLA2G2AFAAHCNR1CNR2
Hydrochloric Acid SCHEMBL957867 0.96 ECE1 (0.41) ECE1PLA2G2AFAAHCNR1CNR2
Hydrochloric Acid SCHEMBL4797820 0.96 ECE1 (0.41) ECE1PLA2G2AFAAHCNR1CNR2
Water SCHEMBL158122 0.81 ECE1 (0.39) ECE1PLA2G2AFAAHCNR1CNR2
Water SCHEMBL502962 0.81 ECE1 (0.39) ECE1PLA2G2AFAAHCNR1CNR2
Water SCHEMBL27080 0.81 ECE1 (0.39) ECE1PLA2G2AFAAHCNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1703327-B1 Composition for forming antireflection film, laminate, and method for forming resist pattern JSR CORP (JP) 2011-05-11 EP disclosed
US-7514205-B2 Composition for forming antireflection film, laminate, and method for forming resist pattern JSR CORPORATION (JP) 2009-04-07 US disclosed
EP-1703327-A2 Composition for forming antireflection film, laminate, and method for forming resist pattern JSR Corporation (JP) 2006-09-20 EP disclosed