Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP12 | P39900 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.37 |
| ▸ | CASP3 | P42574 | 3/20 | 0.37 |
| ▸ | SENP8 | Q96LD8 | 3/20 | 0.37 |
| ▸ | SENP7 | Q9BQF6 | 3/20 | 0.37 |
| ▸ | SENP6 | Q9GZR1 | 3/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12419175 | 0.86 | LMNA (0.41) | MMP1MMP2MMP9MMP12MAPT | |
| SCHEMBL18671963 | 0.85 | KDM4E (0.43) | MAPTMAOBALDH1A1L3MBTL1LMNA | |
| SCHEMBL18671832 | 0.85 | CDC25B (0.37) | ALDH1A1GAAKDM4EGLAKMT2A | |
| SCHEMBL18671843 | 0.84 | EPHX1 (0.45) | ALDH1A1L3MBTL1HPGDKDM4EGLA | |
| SCHEMBL18671830 | 0.80 | IDO1 (0.35) | MAPTRAB9ANPC1ALDH1A1HTT | |
| SCHEMBL19222211 | 0.75 | ESR1 (0.35) | MAPTALDH1A1GAAKDM4EGLA | |
| SCHEMBL20215425 | 0.73 | TYR (0.36) | KDM4E | |
| SCHEMBL12330408 | 0.72 | MAOA (0.53) | MMP1MMP2MMP9MMP12MAPT | |
| SCHEMBL18671929 | 0.72 | OPRK1 (0.47) | MMP1MMP2MMP9MMP12MAPT | |
| SCHEMBL15189314 | 0.71 | CDC25B (0.39) | MAPTALDH1A1GAAKDM4EGLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220404701-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING POLYMER COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-12-22 | — | — | US | disclosed |
| US-9604921-B2 | Sulfonium salt, resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-03-28 | — | — | US | disclosed |