SCHEMBL18862484

SCHEMBL18862484

CCCCN1CCN(CCC(=O)OCCCCOC(=O)CCC(C)(C)CC)CC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HRH2 P25021 7/20 0.41
▸ HRH1 P35367 7/20 0.41
▸ THRB P10828 7/20 0.39
▸ THRA P10827 4/20 0.39
▸ MAPT P10636 2/20 0.38
▸ RECQL P46063 1/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ HTR2C P28335 1/20 0.38
▸ NAAA Q02083 1/20 0.37
▸ DGKA P23743 1/20 0.37
▸ ALDH1A1 P00352 3/20 0.36
▸ LMNA P02545 2/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ CYP1A2 P05177 1/20 0.36
▸ CHRM2 P08172 1/20 0.36
▸ CHRM4 P08173 1/20 0.36
▸ CHRM5 P08912 1/20 0.36
▸ CYP2D6 P10635 1/20 0.36
▸ CYP2C9 P11712 1/20 0.36
▸ ADRA2C P18825 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21125866 0.87 HRH2 (0.40) HRH2HRH1THRBMAPTRECQL
SCHEMBL19102455 0.84 SMN1; SMN2 (0.36) HRH2HRH1THRBTHRAMAPT
SCHEMBL4979398 0.81 NAAA (0.56) THRBTHRAMAPTRECQLL3MBTL1
SCHEMBL11711713 0.81 NAAA (0.56) THRBTHRAMAPTRECQLL3MBTL1
SCHEMBL11598618 0.81 DGKA (0.50) HRH2HRH1THRBTHRAMAPT
SCHEMBL673095 0.81 DGKA (0.50) HRH2HRH1THRBTHRAMAPT
SCHEMBL14344628 0.81 NAAA (0.44) MAPTHTR2CNAAADGKAALDH1A1
SCHEMBL14048718 0.80 NAAA (0.47) MAPTHTR2CNAAADGKAADRA1A
SCHEMBL18717218 0.79 HRH3 (0.36) HRH1NAAACHRM2CHRM4CHRM5
SCHEMBL820593 0.78 THRB (0.40) HRH2HRH1THRBTHRAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10953515-B2 Apparatus and method of forming a polishing pads by use of an additive manufacturing process APPLIED MATERIALS, INC. (US) 2021-03-23 — — US disclosed
US-20170136603-A1 APPARATUS AND METHOD OF FORMING A POLISHING PADS BY USE OF AN ADDITIVE MANUFACTURING PROCESS APPLIED MATERIALS, INC. 2017-05-18 — — US disclosed
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