Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | RARA | P10276 | 1/20 | 0.32 |
| ▸ | RARB | P10826 | 1/20 | 0.32 |
| ▸ | RARG | P13631 | 1/20 | 0.32 |
| ▸ | PIM1 | P11309 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1898804 | 0.93 | TAS1R3 (0.38) | TAS1R3TAS1R1ALDH1A1RARARARB | |
| SCHEMBL1897164 | 0.83 | TAS1R3 (0.35) | TAS1R3TAS1R1ALDH1A1RARARARB | |
| SCHEMBL1901246 | 0.78 | RARB (0.38) | TAS1R3TAS1R1ALDH1A1RARARARB | |
| SCHEMBL1896659 | 0.77 | TSHR (0.31) | — | |
| SCHEMBL9963791 | 0.76 | TAS1R3 (0.40) | TAS1R3TAS1R1ALDH1A1PIM1 | |
| SCHEMBL1901036 | 0.75 | TAS1R3 (0.34) | TAS1R3TAS1R1RARARARBRARG | |
| SCHEMBL24948256 | 0.75 | TAS1R3 (0.39) | TAS1R3TAS1R1ALDH1A1PIM1 | |
| SCHEMBL1900520 | 0.73 | LMNA (0.38) | TAS1R3TAS1R1ALDH1A1RARARARB | |
| SCHEMBL24948267 | 0.73 | ALDH1A1 (0.38) | TAS1R3TAS1R1ALDH1A1RARARARB | |
| SCHEMBL1900731 | 0.73 | TAS1R3 (0.34) | TAS1R3TAS1R1ALDH1A1PIM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | claimed |
| US-20110198730-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION | 2011-08-18 | — | — | US | disclosed |
| US-20110101503-A1 | HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD | LION CORPORATION (JP) | 2011-05-05 | — | — | US | disclosed |
| US-20080160449-A1 | Photoresist polymer having nano-smoothness and etching resistance, and resist composition | LION CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |