SCHEMBL193976

SCHEMBL193976

C=C(C)C(=O)NS(=O)(=O)c1ccccc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCAT1 P54687 1/20 0.53
CA2 P00918 2/20 0.50
KDM4E B2RXH2 3/20 0.49
PTGS2 P35354 3/20 0.49
PTGS1 P23219 2/20 0.49
GAA P10253 1/20 0.49
ALDH1A1 P00352 1/20 0.49
CA1 P00915 1/20 0.48
MMP1 P03956 1/20 0.48
MMP2 P08253 1/20 0.48
MMP9 P14780 1/20 0.48
MMP8 P22894 1/20 0.48
MMP13 P45452 1/20 0.48
HPGD P15428 1/20 0.47
LARS1 Q9P2J5 1/20 0.46
LMNA P02545 1/20 0.45
DHFR P00374 1/20 0.44
TSHR P16473 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
TDP1 Q9NUW8 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10931933 0.84 CA2 (0.60) BCAT1CA2KDM4EPTGS2PTGS1
SCHEMBL195196 0.84 LMNA (0.56) CA2KDM4EPTGS2PTGS1GAA
SCHEMBL7782553 0.82 FBP1 (0.57) ALDH1A1HPGDKMT2A
SCHEMBL14607535 0.80 L3MBTL1 (0.57) GAAALDH1A1LARS1LMNASMN1; SMN2
SCHEMBL27583034 0.80 CA2 (0.56) BCAT1CA2KDM4EPTGS2PTGS1
SCHEMBL209632 0.80 DHFR (0.66) BCAT1CA2KDM4EPTGS2PTGS1
SCHEMBL8424819 0.80 ALDH1A1 (0.59) KDM4EGAAALDH1A1HPGDLMNA
SCHEMBL7784535 0.80 MMP2 (0.57) CA2GAAALDH1A1CA1MMP1
SCHEMBL17044667 0.80 TDP1 (0.49) CA2ALDH1A1CA1MMP1MMP2
SCHEMBL4584838 0.79 BCAT1 (0.50) BCAT1CA2KDM4EPTGS2PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 455 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115260135-B Synthesis method of oxindole compound 浙江工业大学 2024-02-13 CN claimed
CN-117229209-A Synthetic method of isoquinoline-1, 3 (2H, 4H) -dione derivative 浙江工业大学 2023-12-15 CN claimed
CN-115260135-A Synthesis method of oxindole compound 浙江工业大学 2022-11-01 CN claimed
EP-0536690-B1 Light-sensitive composition FUJI PHOTO FILM CO LTD (JP) 1998-09-09 EP claimed
US-5370965-A Storage stable, forms clear images FUJI PHOTO FILM CO., LTD. (JP) 1994-12-06 US claimed
US-5364738-A Divinyl ethers, solubility in developers FUJI PHOTO FILM CO., LTD. (JP) 1994-11-15 US claimed
EP-0536690-A1 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1993-04-14 EP claimed
US-5110709-A Photoresists of excellent image resolution FUJI PHOTO FILM CO., LTD. (JP) 1992-05-05 US claimed
WO-2024085208-A1 COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAM RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT 三菱ケミカル株式会社 2024-04-25 WO disclosed
WO-2024063135-A1 COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAM RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT 三菱ケミカル株式会社 2024-03-28 WO disclosed
EP-4335435-A1 SUSTAINED RELEASING PARTICLE AND METHOD OF PRODUCING SUSTAINED RELEASING PARTICLE Ricoh Company, Ltd. (JP) 2024-03-13 EP disclosed
CN-115260135-B Synthesis method of oxindole compound 浙江工业大学 2024-02-13 CN disclosed
EP-4317155-A1 COMPOUND, METHOD FOR PRODUCING SAME, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL, AND OPTICAL COMPONENT Mitsubishi Chemical Corporation (JP) 2024-02-07 EP disclosed
WO-2024005140-A1 COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, HOLOGRAPHIC RECORDING MEDIUM, OPTICAL MATERIAL AND OPTICAL COMPONENT 三菱ケミカル株式会社 2024-01-04 WO disclosed
US-5110709-A Photoresists of excellent image resolution FUJI PHOTO FILM CO., LTD. (JP) 1992-05-05 US disclosed
US-5002853-A Polymeric Sulfonyloxy-Amides and Iides FUJI PHOTO FILM CO., LTD. (JP) 1991-03-26 US disclosed
EP-0410606-A2 Siloxane polymers and positive working light-sensitive compositions comprising the same FUJI PHOTO FILM CO., LTD. (JP) 1991-01-30 EP disclosed
EP-0410760-A2 Light-sensitive compositions FUJI PHOTO FILM CO., LTD. (JP) 1991-01-30 EP disclosed
EP-0363198-A2 Positive working photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1990-04-11 EP disclosed
EP-0360618-A2 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1990-03-28 EP disclosed