Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 7/20 | 0.55 |
| ▸ | MAPT | P10636 | 3/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | ATM | Q13315 | 2/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | PLEC | Q15149 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1969650 | 0.80 | ALDH1A1 (0.53) | L3MBTL1MAPTALDH1A1MEN1GAA | |
| SCHEMBL4075277 | 0.80 | L3MBTL1 (0.58) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL1968488 | 0.79 | L3MBTL1 (0.53) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL1971325 | 0.79 | L3MBTL1 (0.53) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL3149687 | 0.78 | L3MBTL1 (0.60) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL31054 | 0.77 | L3MBTL1 (0.84) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL5254664 | 0.77 | L3MBTL1 (0.64) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL1973019 | 0.77 | RIPK1 (0.37) | L3MBTL1MAPTNPSR1ALDH1A1MEN1 | |
| SCHEMBL2908416 | 0.76 | L3MBTL1 (0.58) | L3MBTL1MAPTNPSR1ALDH1A1ATM | |
| SCHEMBL1973432 | 0.76 | SLC6A2 (0.40) | NPSR1ALDH1A1POLBMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-12493243-B2 | Film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-09 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250348001-A1 | METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-13 | — | — | US | disclosed |
| US-12339586-B2 | Photocurable resin composition containing self-crosslinkable polymer | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-24 | — | — | US | disclosed |
| US-8877425-B2 | Silicon-containing resist underlayer film forming composition having fluorine-based additive | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8864894-B2 | Resist underlayer film forming composition containing silicone having onium group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-10-21 | — | — | US | disclosed |
| US-8828879-B2 | Silicon-containing composition having sulfonamide group for forming resist underlayer film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| EP-2479615-B1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL IND LTD (JP) | 2014-04-23 | — | — | EP | disclosed |
| US-20130224957-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130183830-A1 | SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-18 | — | — | US | disclosed |
| EP-2479615-A1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120178261-A1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-12 | — | — | US | disclosed |
| EP-2336256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | L3MBTL1 1431/4885MAPT 965/4885NPSR1 4349/4885 |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | SRR, KDM2B, MSR1 | L3MBTL1 1038/4885MAPT 3963/4885NPSR1 2564/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | L3MBTL1 809/4885MAPT 4790/4885NPSR1 3526/4885 |
| US-20120178261-A1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | STS, SI, MUS81 | L3MBTL1 3095/4885MAPT 2484/4885NPSR1 3328/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.