Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.50 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.49 |
| ▸ | GAA | P10253 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | XBP1 | P17861 | 1/20 | 0.47 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.45 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | CNR2 | P34972 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2470744 | 0.91 | CA9 (0.45) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL17292426 | 0.86 | L3MBTL1 (0.50) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL16586710 | 0.77 | CYP17A1 (0.42) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL1634162 | 0.76 | GAA (0.72) | KDM4EALDH1A1GAAMAPTXBP1 | |
| SCHEMBL16584583 | 0.76 | CYP17A1 (0.41) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL3454498 | 0.76 | ALDH1A1 (0.51) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL3454542 | 0.74 | ALDH1A1 (0.49) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL1398383 | 0.73 | ALDH1A1 (0.48) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL2775742 | 0.73 | KDM4E (0.45) | KDM4ECA9ENPP3CA2ENPP1 | |
| SCHEMBL1733254 | 0.71 | CYP17A1 (0.73) | KDM4EALDH1A1GAAMAPTXBP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230112897-A1 | COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-13 | — | — | US | disclosed |
| US-11448961-B2 | Iodonium salt, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-20 | — | — | US | disclosed |
| US-20210054231-A1 | COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2021-02-25 | — | — | US | disclosed |
| US-20200081341-A1 | IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-12 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |
| US-9665002-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-30 | — | — | US | disclosed |
| US-20160259242-A1 | NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-09-08 | — | — | US | disclosed |
| US-20160131972-A1 | NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-12 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160259242-A1 | NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | LIFR, NHERF1, INSR | KDM4E 2501/4885CA9 379/4885ENPP3 4549/4885 |
| US-20160131972-A1 | NOVEL ONIUM SALT COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | LIFR, NHERF1, MIF | KDM4E 964/4885CA9 1053/4885ENPP3 4660/4885 |
| US-20200081341-A1 | IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | ETV6, ELOVL5, EEF2 | KDM4E 832/4885CA9 1842/4885ENPP3 3120/4885 |
| US-11448961-B2 | Iodonium salt, resist composition, and pattern forming process | ETV6, ELOVL5, EEF2 | KDM4E 832/4885CA9 1842/4885ENPP3 3120/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.