SCHEMBL19901948

SCHEMBL19901948

COCN1CC(OCCOc2ccc(C(CC(C)C)C(C)C)cc2)CN(COC)C1=O

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.37
LIPE Q05469 3/20 0.35
ACACB O00763 5/20 0.34
KDM4E B2RXH2 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
MAOB P27338 2/20 0.32
GAA P10253 1/20 0.32
HTT P42858 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
MAPK1 P28482 1/20 0.32
HPGD P15428 1/20 0.32
ALDH1A1 P00352 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CTDSP1 Q9GZU7 1/20 0.31
S1PR1 P21453 1/20 0.31
S1PR5 Q9H228 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20109662 0.84 POLB (0.34) POLBMEN1KMT2A
SCHEMBL19901949 0.83 RAB9A (0.40) POLBACACBGAAMEN1KMT2A
SCHEMBL18100897 0.83 ALDH1A1 (0.46) ACACBKDM4ETDP1MAOBHTT
SCHEMBL19901945 0.73 POLB (0.33) POLBKMT2A
SCHEMBL19901978 0.71 HTR3E (0.33)
SCHEMBL19184544 0.71 RXRA (0.40) ACACBTDP1GAAHTTMAPK1
SCHEMBL18356147 0.69 TDP1 (0.44) ACACBKDM4ETDP1MEN1KMT2A
SCHEMBL19998126 0.67 NAAA (0.35) MEN1KMT2AALDH1A1NPSR1
SCHEMBL15978740 0.67 ALDH1A1 (0.49) POLBACACBTDP1MEN1KMT2A
SCHEMBL19954452 0.66 CA12 (0.40) GAAHTTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9904168-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-02-27 US disclosed