Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS2 | P35354 | 2/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.34 |
| ▸ | DRD2 | P14416 | 1/20 | 0.33 |
| ▸ | PDE5A | O76074 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4449407 | 0.80 | S100A4 (0.33) | MAOASOAT1ALDH1A1 | |
| SCHEMBL310210 | 0.76 | SOAT1 (0.36) | PTGS2MAOAMAOBSOAT1CA12 | |
| SCHEMBL10350653 | 0.72 | PTGS2 (0.55) | PTGS2MAOAMAOBSOAT1CA12 | |
| SCHEMBL30548746 | 0.72 | PTGS2 (0.55) | PTGS2MAOAMAOBSOAT1CA12 | |
| SCHEMBL30449704 | 0.69 | HTR7 (0.44) | PTGS2MAOAMAOBSOAT1CA12 | |
| SCHEMBL13397723 | 0.68 | MAOA (0.47) | PTGS2MAOAMAOBSOAT1CA12 | |
| SCHEMBL8732658 | 0.68 | MAP2K7 (0.33) | — | |
| SCHEMBL10869222 | 0.67 | CYP1A2 (0.34) | PTGS2SOAT1DRD2ALDH1A1HPGD | |
| SCHEMBL8465932 | 0.67 | — | — | |
| SCHEMBL8734609 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11548984-B2 | Light- or heat-curing method and curable resin composition | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2023-01-10 | — | — | US | disclosed |
| CN-108602955-B | Photocuring method, compound used in photocuring method, and composition | 富士胶片和光纯药株式会社 | 2021-08-06 | — | — | CN | disclosed |
| US-10774062-B2 | Photocuring method, compound and composition used therein | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2020-09-15 | — | — | US | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| EP-3409709-B1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-20200123324-A1 | LIGHT- OR HEAT-CURING METHOD AND CURABLE RESIN COMPOSITION | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| CN-110678500-A | Photo-or thermosetting method and curable resin composition | 富士胶片和光纯药株式会社 | 2020-01-10 | — | — | CN | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190055210-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3409709-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | FUJIFILM Wako Pure Chemical Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | PTGS2 1090/4885MAOA 1168/4885MAOB 1640/4885 |
| US-20190055210-A1 | PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN | ESD, TMT1A, PAM | PTGS2 298/4885MAOA 1606/4885MAOB 1861/4885 |
| US-10774062-B2 | Photocuring method, compound and composition used therein | ESD, TMT1A, PAM | PTGS2 298/4885MAOA 1606/4885MAOB 1861/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | PTGS2 1090/4885MAOA 1168/4885MAOB 1640/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.