SCHEMBL2103502

SCHEMBL2103502

Clc1cccc([Si](Cl)(Cl)Cl)c1Cl

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.44
PNMT P11086 2/20 0.41
CYP1A2 P05177 2/20 0.39
CYP2A6 P11509 1/20 0.39
LMNA P02545 2/20 0.38
CYP2D6 P10635 2/20 0.37
CYP3A4 P08684 1/20 0.37
NFKB1 P19838 1/20 0.37
TAAR1 Q96RJ0 1/20 0.37
IDO1 P14902 3/20 0.35
ALDH1A1 P00352 2/20 0.35
GLA P06280 1/20 0.35
NOTUM Q6P988 1/20 0.35
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
TDP1 Q9NUW8 1/20 0.33
MAOA P21397 1/20 0.33
MAPK1 P28482 1/20 0.33
ADRA1A P35348 1/20 0.33
SCN4A P35499 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10406900 0.89 PNMT (0.39) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL1225074 0.78 TSHR (0.50) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL9571098 0.77 TSHR (0.42) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL3792531 0.76 CYP3A4 (0.42) CYP2A6CYP3A4NOTUMTDP1MAPK1
SCHEMBL7081177 0.75 TSHR (0.37) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL23239 0.73
SCHEMBL3991309 0.73 TSHR (0.61) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL3338297 0.72 TSHR (0.38) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL5326981 0.72 TSHR (0.38) TSHRPNMTCYP1A2CYP2A6LMNA
SCHEMBL7199355 0.70 FABP4 (0.44) TSHRCYP1A2CYP2A6LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104262515-B A kind of granular random/stereoblock polystyrene preparation method 沈阳化工大学 2017-08-08 CN claimed
CN-105399910-A A styrene-conjugated diene block copolymer and a preparing method thereof UNIV SHENYANG CHEMICAL TECH 2016-03-16 CN claimed
CN-104262515-A Method for preparing granular random/stereoblock polystyrene UNIV SHENYANG CHEMICAL TECH 2015-01-07 CN claimed
EP-1932060-B1 NEGATIVE PHOTOSENSITIVE COMPOSITION FOR SILICON KOH ETCH WITHOUT USING SILICON NITRIDE HARDMASK BREWER SCIENCE INC (US) 2013-03-27 EP claimed
US-7144505-B2 Melt-spun polysulfone semipermeable membranes and methods for making the same BAXTER INTERNATIONAL INC. (US) 2006-12-05 US claimed
CN-1729044-A Melt spun polysulfone semipermeable membranes and methods of making the same BAXTER INT (US) 2006-02-01 CN claimed
EP-1572331-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME Baxter International Inc. (US) 2005-09-14 EP claimed
US-6881337-B2 Melt-spun polysulfone semipermeable membranes and methods for making the same BAXTER INTERNATIONAL INC. (US) 2005-04-19 US claimed
WO-2004058385-A9 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME BAXTER INT (US) 2004-11-25 WO claimed
WO-2004058385-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME BAXTER INTERNATIONAL INC. (US) 2004-07-15 WO claimed
US-20040026315-A1 Melt-spun polysulfone semipermeable membranes and methods for making the same BAXTER HEALTHCARE S.A. (CH) 2004-02-12 US claimed
JP-2001507741-A 2001-06-12 JP claimed
US-20010003123-A1 Melt-spun polysulfone semipermeable membranes and methods for making the same MELUCH TIMOTHY B (US) 2001-06-07 US claimed
US-6218441-B1 USEFUL FOR LIQUID SEPARATION PROCESSES, SUCH AS, BUT NOT LIMITED TO, MICROFILTRATION, ULTRAFILTRATION, DIALYSIS, AND REVERSE OSMOSIS BAXTER INTERNATIONAL INC. 2001-04-17 US claimed
EP-0951498-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME Althin Medical, Inc. (US) 1999-10-27 EP claimed
EP-0637902-B1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC (US) 1999-03-31 EP claimed
WO-1998029478-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME ALTHIN MEDICAL, INC. (US) 1998-07-09 WO claimed
CN-1106977-A Metallic foil with adhesion promoting layer COULD ELECTRONICS INC (US) 1995-08-16 CN claimed
EP-0637902-A1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC. (US) 1995-02-08 EP claimed
CN-109716491-B Method for manufacturing field effect transistor and method for manufacturing wireless communication device 东丽株式会社 2023-06-09 CN disclosed
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
US-11094899-B2 Method for manufacturing field effect transistor and method for manufacturing wireless communication device TORAY INDUSTRIES, INC. 2021-08-17 US disclosed
US-11066191-B2 System and method for detecting substances from spectral signatures BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC. (US) 2021-07-20 US disclosed
US-20200317373-A1 SYSTEM AND METHOD FOR DETECTING SUBSTANCES FROM SPECTRAL SIGNATURES BAE SYSTEMS INFORMATION AND ELECTRONIC SYSTEMS INTEGRATION INC. (US) 2020-10-08 US disclosed
US-20200222354-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE BIOGEN MA INC. (US) 2020-07-16 US disclosed
CN-110191889-A Silsesquioxane derivative, its composition and low cure shrinkage cured film with free-radical polymerised functional group 捷恩智株式会社 2019-08-30 CN disclosed
EP-3514822-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE Toray Industries, Inc. (JP) 2019-07-24 EP disclosed
US-20190198786-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2019-06-27 US disclosed
CN-109716491-A The manufacturing method of field effect transistor and the manufacturing method of wireless telecom equipment 东丽株式会社 2019-05-03 CN disclosed
CN-105399910-B A kind of styrene conjugated diene block copolymer and preparation method thereof 沈阳化工大学 2019-04-05 CN disclosed
CN-105190901-B Field effect transistor 东丽株式会社 2018-12-04 CN disclosed
US-20180263946-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE BIOGEN MA INC. (US) 2018-09-20 US disclosed
US-20180185319-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE BIOGEN MA INC. 2018-07-05 US disclosed
US-9421273-B2 Silicon-containing fumaric acid esters BIOGEN MA INC. (US) 2016-08-23 US disclosed
US-20160115540-A1 PRODRUGS AND DRUGS BIOGEN MA INC. 2016-04-28 US disclosed
EP-2999482-A2 PRODRUGS AND DRUGS Biogen MA Inc. (US) 2016-03-30 EP disclosed
CN-105399910-A A styrene-conjugated diene block copolymer and a preparing method thereof UNIV SHENYANG CHEMICAL TECH 2016-03-16 CN disclosed
US-20160035457-A1 FIELD EFFECT TRANSISTOR TORAY INDUSTRIES, INC. (JP) 2016-02-04 US disclosed
EP-2975649-A1 FIELD EFFECT TRANSISTOR Toray Industries, Inc. (JP) 2016-01-20 EP disclosed
CN-105190901-A Field effect transistor TORAY INDUSTRIES 2015-12-23 CN disclosed
WO-2015172083-A1 DIMETHYLFUMARATE AND PRODRUGS FOR TREATMENT OF MULTIPLE SCLEROSIS BIOGEN MA INC. (US) 2015-11-12 WO disclosed
WO-2015128492-A1 MONOMETHYL- AND DIMETHYLFUMARATE FOR NK CELL ACTIVATION MAGHAZACHI AZZAM A (NO) 2015-09-03 WO disclosed
US-20150209318-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE BIOGEN MA INC. 2015-07-30 US disclosed
CN-102282103-B Advanced silane composition and method for producing substrate with film JAPANESE ORGANIZATION JAPAN SC 2015-01-28 CN disclosed
CN-104262515-A Method for preparing granular random/stereoblock polystyrene UNIV SHENYANG CHEMICAL TECH 2015-01-07 CN disclosed
EP-2811994-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE Biogen Idec MA Inc. (US) 2014-12-17 EP disclosed
WO-2014190056-A2 PRODRUGS AND DRUGS BIOGEN IDEC MA INC. (US) 2014-11-27 WO disclosed
US-20140336151-A1 Silicon-Containing Fumaric Acid Esters BIOGEN MA INC. 2014-11-13 US disclosed
EP-2791181-A1 SILICON-CONTAINING FUMARIC ACID ESTERS Biogen Idec MA Inc. (US) 2014-10-22 EP disclosed
US-8673682-B2 High order silane composition and method of manufacturing a film-coated substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2014-03-18 US disclosed
US-20130295169-A1 Pharmaceutical Compositions Containing Dimethyl Fumarate BIOGEN MA INC. 2013-11-07 US disclosed
US-20130216615-A1 Pharmaceutical Compositions Containing Dimethyl Fumarate BIOGEN IDEC MA INC. 2013-08-22 US disclosed
WO-2013119677-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE BIOGEN IDEC MA INC. (US) 2013-08-15 WO disclosed
WO-2013090799-A1 SILICON-CONTAINING FUMARIC ACID ESTERS BIOGEN IDEC MA INC. (US) 2013-06-20 WO disclosed
US-8441002-B2 Organic semiconductor composite, organic transistor material and organic field effect transistor TORAY INDUSTRIES, INC. (JP) 2013-05-14 US disclosed
EP-2109162-B1 ORGANIC SEMICONDUCTOR COMPOSITE, ORGANIC TRANSISTOR MATERIAL AND ORGANIC FIELD EFFECT TRANSISTOR TORAY INDUSTRIES (JP) 2013-05-01 EP disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
CN-102633827-A Method for preparing polychlorinated phenyl trichlorosilane through catalysis of ionic liquid UNIV JIANGSU 2012-08-15 CN disclosed
EP-1037511-B1 Surface treatment of copper to prevent microcracking in flexible circuits JX NIPPON MINING & METALS CORP (JP) 2012-07-18 EP disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110318939-A1 HIGH ORDER SILANE COMPOSITION AND METHOD OF MANUFACTURING A FILM-COATED SUBSTRATE JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2011-12-29 US disclosed
CN-102282103-A Advanced silane composition and method for producing substrate with film 2011-12-14 CN disclosed
US-8038972-B2 Higher order silane composition, method for manufacturing film-coated substrate, electro-optical device and electronic device SEIKO EPSON CORPORATION (JP) 2011-10-18 US disclosed
EP-2371984-A1 Method for producing a coated metal wire Van Merksteijn Quality Wire Belgium (BE) 2011-10-05 EP disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20100102299-A1 ORGANIC SEMICONDUCTOR COMPOSITE, ORGANIC TRANSISTOR MATERIAL AND ORGANIC FIELD EFFECT TRANSISTOR TORAY INDUSTRIES, INC. (JP) 2010-04-29 US disclosed
EP-2109162-A1 ORGANIC SEMICONDUCTOR COMPOSITE, ORGANIC TRANSISTOR MATERIAL AND ORGANIC FIELD EFFECT TRANSISTOR Toray Industries, Inc. (JP) 2009-10-14 EP disclosed
EP-1428795-B1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORP (JP) 2009-07-22 EP disclosed
US-20090155454-A1 HIGHER ORDER SILANE COMPOSITION, METHOD FOR MANUFACTURING FILM-COATED SUBSTRATE, ELECTRO-OPTICAL DEVICE AND ELECTRONIC DEVICE SEIKO EPSON CORPORATION (JP) 2009-06-18 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
US-7449539-B2 Silsesquioxane derivative and production process for the same CHISSO CORPORATION (JP) 2008-11-11 US disclosed
CN-100391730-C Copper surface treatment for preventing microcrack in soft circuit GA TURCH INC (US) 2008-06-04 CN disclosed
EP-0896502-B1 Method of treating metal foil for enhancing adhesion NIKKO MATERIALS USA INC (US) 2007-10-03 EP disclosed
US-7235619-B2 Silsesquioxane derivative CHISSO CORPORATION (JP) 2007-06-26 US disclosed
US-20070032454-A1 Silsesquioxane derivative and production process for the same JNC CORPORATION (JP) 2007-02-08 US disclosed
US-7169873-B2 Silsesquioxane derivatives and process for production thereof CHISSO CORPORATION (JP) 2007-01-30 US disclosed
US-7144505-B2 Melt-spun polysulfone semipermeable membranes and methods for making the same BAXTER INTERNATIONAL INC. (US) 2006-12-05 US disclosed
CN-1729044-A Melt spun polysulfone semipermeable membranes and methods of making the same BAXTER INT (US) 2006-02-01 CN disclosed
US-20050215807-A1 Silsesquioxane derivative JNC CORPORATION (JP) 2005-09-29 US disclosed
EP-1572331-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME Baxter International Inc. (US) 2005-09-14 EP disclosed
CN-1212048-C Adhesion enhancement for metal foil GATECH CO (US) 2005-07-20 CN disclosed
US-6881337-B2 Melt-spun polysulfone semipermeable membranes and methods for making the same BAXTER INTERNATIONAL INC. (US) 2005-04-19 US disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 US disclosed
WO-2004058385-A9 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME BAXTER INT (US) 2004-11-25 WO disclosed
WO-2004058385-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME BAXTER INTERNATIONAL INC. (US) 2004-07-15 WO disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 EP disclosed
CN-1143010-C Metal foil with raised bonding capacity for base and its manufacturing method 加-特克公司 2004-03-24 CN disclosed
US-20040030084-A1 Production process for silsesquioxane derivative and silsesquioxane derivative JNC CORPORATION (JP) 2004-02-12 US disclosed
US-20040026315-A1 Melt-spun polysulfone semipermeable membranes and methods for making the same BAXTER HEALTHCARE S.A. (CH) 2004-02-12 US disclosed
EP-0974685-B1 Method for making a metal foil with improved bonding to substrates GA TEK INC (US) 2003-12-03 EP disclosed
US-20010003123-A1 Melt-spun polysulfone semipermeable membranes and methods for making the same MELUCH TIMOTHY B (US) 2001-06-07 US disclosed
US-6221176-B1 PROVIDING COPPER LAYER; TREATING COPPER LAYER TO PREVENT MICROCRACKING; AFFIXING FIRST SIDE OF COPPER LAYER TO FIRST FLEXIBLE POLYMERIC FILM; PATTERNING COPPER LAYER; AFFIXING SECOND FLEXIBLE POLYMERIC FILM TO SECOND SIDE OF COPPER LAYER GOULD ELECTRONICS, INC. 2001-04-24 US disclosed
US-6218441-B1 USEFUL FOR LIQUID SEPARATION PROCESSES, SUCH AS, BUT NOT LIMITED TO, MICROFILTRATION, ULTRAFILTRATION, DIALYSIS, AND REVERSE OSMOSIS BAXTER INTERNATIONAL INC. 2001-04-17 US disclosed
CN-1267596-A Copper surface treatment for preventing microcrack in soft circuit GA TURCH INC (US) 2000-09-27 CN disclosed
EP-1037511-A2 Surface treatment of copper to prevent microcracking in flexible circuits GA-TEK Inc. (US) 2000-09-20 EP disclosed
US-6086743-A Adhesion enhancement for metal foil GOULD ELECTRONICS, INC. (US) 2000-07-11 US disclosed
CN-1245837-A Metal foil with raised bonding capacity for base and its manufacturing method GOULD ELECTRONIC CO LTD (US) 2000-03-01 CN disclosed
EP-0974685-A1 Metal foil with improved bonding to substrates and method for making said foil Gould Electronics Inc. (US) 2000-01-26 EP disclosed
EP-0951498-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME Althin Medical, Inc. (US) 1999-10-27 EP disclosed
CN-1224327-A Adhesion enhancement for metal foil GOULD ELECTRONIC INC (US) 1999-07-28 CN disclosed
US-5908542-A CONTACTING A METAL FOIL WITH AN ACIDIC SOLUTION; PLACING THE METAL FOIL IN A NICKEL TREATMENT BATH AND APPLYING A CURRENT THROUGH THE NICKEL TREATMENT BATH, WHEREIN THE NICKEL TREATMENT BATH CONTAINS AT LEAST ABOUT TWO PLATING ZONES, GOULD ELECTRONICS INC. (US) 1999-06-01 US disclosed
EP-0637902-B1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC (US) 1999-03-31 EP disclosed
US-5885436-A Adhesion enhancement for metal foil GOULD ELECTRONICS INC. (US) 1999-03-23 US disclosed
EP-0896502-A1 Method of treating metal foil for enhancing adhesion Gould Electronics Inc. (US) 1999-02-10 EP disclosed
EP-0676425-B1 Hydrogenated block copolymer and hydrogenated block copolymer composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1998-09-09 EP disclosed
WO-1998029478-A1 MELT-SPUN POLYSULFONE SEMIPERMEABLE MEMBRANES AND METHODS FOR MAKING THE SAME ALTHIN MEDICAL, INC. (US) 1998-07-09 WO disclosed
EP-0544304-B1 Catalyst composition for hydrogenating olefinically unsaturated polymers JAPAN SYNTHETIC RUBBER CO LTD (JP) 1998-02-04 EP disclosed
US-5622782-A USEFUL IN MANUFACTURE OF PRINTED CIRCUIT BOARDS GOULD INC. (US) 1997-04-22 US disclosed
US-5596041-A HYDROGENATED STAR BRANCHED BLOCK COPOLYMERS OF BUTADIENE FOR IMPACT STRENGTH, HEAT RESISTANCE, STIFFNESS AND MOLDINGS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-01-21 US disclosed
EP-0676425-A1 Hydrogenated block copolymer and hydrogenated block copolymer composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-11 EP disclosed
CN-1106977-A Metallic foil with adhesion promoting layer COULD ELECTRONICS INC (US) 1995-08-16 CN disclosed
EP-0434469-B1 Hydrogenation catalyst composition and process for hydrogenating olefinically unsaturated polymer using the same JAPAN SYNTHETIC RUBBER CO LTD (JP) 1995-02-22 EP disclosed
EP-0637902-A1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC. (US) 1995-02-08 EP disclosed
US-5270388-A Aromatic vinyl-diene copolymer NIPPON ZEON CO., LTD. (JP) 1993-12-14 US disclosed
US-5270274-A Catalyst composition for hydrogenating olefinically unsaturated polymers JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-12-14 US disclosed
EP-0544304-A1 Catalyst composition for hydrogenating olefinically unsaturated polymers JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-06-02 EP disclosed
US-5169905-A Using a bis(cyclopentadienyl)transition metal compound and an alkali aluminum organic complex as catalyst JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-12-08 US disclosed
EP-0339986-B1 NOVEL CATALYST FOR HYDROGENATION OF POLYMER AND PROCESS FOR HYDROGENATING POLYMER WITH THE CATALYST JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-12-02 EP disclosed
EP-0454173-A2 Shape-memorizing block copolymer composition NIPPON ZEON CO., LTD. (JP) 1991-10-30 EP disclosed
EP-0434469-A2 Hydrogenation catalyst composition and process for hydrogenating olefinically unsaturated polymer using the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-06-26 EP disclosed
EP-0366486-A2 A shape-memorizable block copolymer, the method of using it and shape memory products NIPPON ZEON CO., LTD. (JP) 1990-05-02 EP disclosed
EP-0349536-A1 BLOCK COPOLYMER COMPOSITION AND PROCESS FOR THE PREPARATION THER EOF SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1990-01-10 EP disclosed
EP-0339986-A1 Novel catalyst for hydrogenation of polymer and process for hydrogenating polymer with the catalyst JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1989-11-02 EP disclosed
WO-1989006660-A1 BLOCK COPOLYMER COMPOSITION AND PROCESS FOR THE PREPARATION THER EOF SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) 1989-07-27 WO disclosed
EP-0324992-A1 Block copolymer composition and process for the preparation thereof SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1989-07-26 EP disclosed
EP-0067217-A4 COMPOSITIONS OF POLYPHENYLENE OXIDES WITH EPDM-SILICONE RUBBER. GEN ELECTRIC (US) 1983-05-16 EP disclosed
EP-0067217-A1 COMPOSITIONS OF POLYPHENYLENE OXIDES WITH EPDM-SILICONE RUBBER GENERAL ELECTRIC COMPANY (US) 1982-12-22 EP disclosed
US-4365042-A Compositions of polyphenylene oxides with EPDM-silicone rubber GENERAL ELECTRIC COMPANY (US) 1982-12-21 US disclosed
US-4365038-A MOLDING MATERIALS OF GOOD IMPACT STRENGTH AT LOW TEMPERATURES GENERAL ELECTRIC COMPANY (US) 1982-12-21 US disclosed
WO-1982002204-A1 COMPOSITIONS OF POLYPHENYLENE OXIDES WITH EPDM-SILICONE RUBBER GEN ELECTRIC (US) 1982-07-08 WO disclosed
US-4335032-A MOLDING MATERIALS GENERAL ELECTRIC COMPANY (US) 1982-06-15 US disclosed
US-4335032-A MOLDING MATERIALS GENERAL ELECTRIC COMPANY (US) 1982-06-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180263946-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE FH, FAH, MGMT TSHR 4777/4885PNMT 1425/4885CYP1A2 1427/4885
US-20180185319-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE FH, FAH, MGMT TSHR 4777/4885PNMT 1425/4885CYP1A2 1427/4885
US-20160115540-A1 PRODRUGS AND DRUGS CYP2D6, PAICS, UGT2B7 TSHR 1875/4885PNMT 1091/4885CYP1A2 47/4885
US-20150209318-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE FH, FAH, MGMT TSHR 4777/4885PNMT 1425/4885CYP1A2 1427/4885
US-20050215807-A1 Silsesquioxane derivative STS, SFXN1, SULT1A1 TSHR 4284/4885PNMT 3524/4885CYP1A2 423/4885
US-20130216615-A1 Pharmaceutical Compositions Containing Dimethyl Fumarate FH, FAH, MGMT TSHR 4777/4885PNMT 1425/4885CYP1A2 1427/4885
US-20130295169-A1 Pharmaceutical Compositions Containing Dimethyl Fumarate FH, FAH, MGMT TSHR 4777/4885PNMT 1425/4885CYP1A2 1427/4885
US-20200222354-A1 PHARMACEUTICAL COMPOSITIONS CONTAINING DIMETHYL FUMARATE FH, FAH, MGMT TSHR 4777/4885PNMT 1425/4885CYP1A2 1427/4885
US-20140336151-A1 Silicon-Containing Fumaric Acid Esters FAH, SCLY, FH TSHR 3859/4885PNMT 4744/4885CYP1A2 2331/4885
US-20070032454-A1 Silsesquioxane derivative and production process for the same KCNQ1, KCNQ2, KCNQ5 TSHR 4266/4885PNMT 1857/4885CYP1A2 1262/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.