Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL2139534

C[N+](C)(C)C.N.O.[OH-]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023133876-A1 FLUORINE-FREE CLEANING AGENT, PREPARATION METHOD THEREFOR AND USE THEREOF 嘉庚创新实验室 2023-07-20 WO claimed
CN-111377825-A 1, 2-cyclohexanediaminetetraacetic acid and purification method thereof 安集微电子科技(上海)股份有限公司 2020-07-07 CN claimed
CN-109859955-A A kind of preparation method of ruthenic oxide/charcoal combination electrode material 昆明理工大学 2019-06-07 CN claimed
CN-109153690-A Silsesquioxane resins and silicyl acid anhydride composition 美国陶氏有机硅公司 2019-01-04 CN claimed
CN-109071576-A Silsesquioxane resin and an oxaamine composition 美国陶氏有机硅公司 2018-12-21 CN claimed
CN-106715399-A Diazirine compounds as photocrosslinkers and photoimageable compositions comprising them 普罗米鲁斯有限责任公司 2017-05-24 CN claimed
CN-103864626-B A kind of production equipment and process of shortening of 4-ADPA SHANDONG SUNSINE CHEMICAL CO.,LTD. (CN) 2016-04-06 CN claimed
CN-103819346-B A kind of production unit of precursor of 4-ADPA and production technique SHANDONG SUNSINE CHEMICAL CO.,LTD. (CN) 2015-11-04 CN claimed
CN-103627013-B A kind of preparation method of modified polyvinilidene fluoride one step grafting sulphonic acid betaine (SBMA) proton exchange membrane University of Science and Technology of Inner Mongolia (CN) 2015-09-30 CN claimed
CN-102051125-B Chemical mechanical polishing (CMP) solution ANJI MICROELECTRONICS SHANGHAI 2014-06-18 CN claimed
CN-103864626-A Device and process for producing 4-aminodiphenylamine by catalytic hydrogenation SHANDONG SUNSINE CHEMICAL CO LTD 2014-06-18 CN claimed
CN-103819346-A Production equipment and production technology of precursor of 4-aminodiphenylamine SHANDONG SUNSINE CHEMICAL CO LTD 2014-05-28 CN claimed
CN-102051125-A Chemical mechanical polishing (CMP) solution ANJI MICROELECTRONICS SHANGHAI 2011-05-11 CN claimed
US-6082373-A Cleaning method KABUSHIKI KAISHA TOSHIBA (JP) 2000-07-04 US claimed
EP-0723677-B1 TOP ANTI-REFLECTIVE COATING FILMS CLARIANT FINANCE BVI LTD (VG) 2000-03-22 EP claimed
EP-0723677-A1 TOP ANTI-REFLECTIVE COATING FILMS HOECHST CELANESE CORPORATION (US) 1996-07-31 EP claimed
WO-1995010798-A1 TOP ANTI-REFLECTIVE COATING FILMS HOECHST CELANESE CORPORATION (US) 1995-04-20 WO claimed
CN-119780328-A Method for measuring halogen content in electrolyte by oxygen bomb combustion-turbidimetry 广东风华高新科技股份有限公司 2025-04-08 CN disclosed
CN-1125044-C Novel prostaglandin synthase inhibitors DU PONT MERCK PHARMA (US) 2003-10-22 CN disclosed
CN-1166167-A Novel prostaglandin synthase inhibitors DU PONT MERCK PHARMA (US) 1997-11-26 CN disclosed